Excitation and relaxation dynamics in ultrafast laser irradiated optical glasses
Excitation and relaxation dynamics in ultrafast laser irradiated optical glasses作者机构：Laboratoire Hubert CurienUMR 5516 CNRSUniversité de LyonUniversité Jean Monnet Max-Born-Institut für Nichtlineare Optik und Kurzzeitspektroskopie Bundesanstalt für Materialforschung und-prüfung (BAM)
出 版 物：《High Power Laser Science and Engineering》 (高功率激光科学与工程（英文版）)
年 卷 期：2016年第4卷第4期
页 面：1-8页
核心收录：
学科分类：0808[工学-电气工程] 080901[工学-物理电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 0807[工学-动力工程及工程热物理] 080401[工学-精密仪器及机械] 0804[工学-仪器科学与技术] 0827[工学-核科学与技术] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 0703[理学-化学] 0803[工学-光学工程] 0702[理学-物理学] 0801[工学-力学（可授工学、理学学位）]
主 题：carrier plasmas glasses pulse shaping refractive index engineering ultrafast laser excitation
摘 要：We discuss the dynamics of ultrashort pulsed laser excitation in bulk optical silica-based glasses(fused silica and borosilicate BK7) well-above the permanent modification threshold. We indicate subsequent structural and thermomechanical energy relaxation paths that translate into positive and negative refractive index changes, compression and rarefaction zones. If fast electronic decay occurs at low excitation levels in fused silica via self-trapping of excitons,for carrier densities in the vicinity of the critical value at the incident wavelength, persistent long-living absorptive states indicate the achievement of low viscosity matter states manifesting pressure relaxation, rarefaction, void opening and compaction in the neighboring domains. An intermediate ps-long excited carrier dynamics is observed for BK7 in the range corresponding to structural expansion and rarefaction. The amount of excitation and the strength of the subsequent hydrodynamic evolution is critically dependent on the pulse time envelope, indicative of potential optimization schemes.
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