Microstructure and mechanical properties of TiN/AlN multilayers deposited by filtered vacuum arc deposition
Microstructure and mechanical properties of TiN/AlN multilayers deposited by filtered vacuum arc deposition作者机构：Key Laboratory of Beam Technology and Material Modification of Ministry of EducationInstitute of Low Energy Nuclear Physics Beijing Normal UniversityBeijing Radiation Center Beijing 100875 China Key Laboratory of Beam Technology and Material Modification of Ministry of EducationInstitute of Low Energy Nuclear Physics Beijing Normal UniversityBeijing Radiation Center Beijing 100875 China Key Laboratory of Beam Technology and Material Modification of Ministry of EducationInstitute of Low Energy Nuclear Physics Beijing Normal UniversityBeijing Radiation Center Beijing 100875 China Key Laboratory of Beam Technology and Material Modification of Ministry of EducationInstitute of Low Energy Nuclear Physics Beijing Normal UniversityBeijing Radiation Center Beijing 100875 China
出 版 物：《中国有色金属学会会刊：英文版》 (Transactions of Nonferrous Metals Society of China)
年 卷 期：2004年第14卷第z1期
页 面：234-237页
核心收录：
学科分类：080503[工学-材料加工工程] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）]
基 金：Project(50141022) supported by the National Natural Science Foundation of China
主 题：multilayer filtered arc nanometer wear
摘 要：Nanometer TiN/AlN multilayers were prepared on silicon substrate by filtered vacuum arc *** structures of the nanometer TiN/AlN multilayer were studied by using X-ray diffraction. The 12 nm TiN/AlN multiplayer is composed of cubic TiN structure and hexagonal wurzite AlN structure, but the 2 nm period multilayer is composed of face centered cubic structure TiN and AlN with strong (200) texture. The surface roughness, hardness and elastic modulus of multilayer are dependent on the period of multilayer. The hardness of the TiN/AlN multilayers is higher than that suggested by a simple rule of mixture. The peaking hardness of nanometer TiN/AlN multilayers at period of 2 nm is about 42 GPa, much higher than that of 12 nm. The wear resistance of the nanometer TiN/AlN multilayers was also studied.
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