Plasma polymerized acetylene deposition using a return corona enhanced plasma reactor

作     者：Rokibul ISLAM Shuzheng XIE Karl R ENGLUND Patrick D PEDROW 

作者机构：School of Electrical Engineering and Computer ScienceWashington State University Composite Materials and Engineering CenterWashington State University 

出 版 物：《Plasma Science and Technology》 (等离子体科学和技术（英文版）)

年 卷 期：2017年第19卷第8期

页      面：90-96页

核心收录：

学科分类：080901[工学-物理电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 07[理学] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 070204[理学-等离子体物理] 0702[理学-物理学] 

主　　题：acetylene corona return nodules downstream initiated weakly nucleation resistive sized 

摘      要：A corona based weakly ionized plasma source was developed to deposit plasma polymerized acetylene coating at atmospheric pressure. The plasma source included a distinctive point-topoint geometry consisting of an array of high voltage needles and an array of protrusions placed over a grounded screen. The geometry facilitated various corona discharge modes that included return corona to contribute plasma polymerized acetylene deposition downstream from the corona section. Scanning probe techniques were used to investigate deposition on both the leading surface and the trailing surface of substrates. Deposition was initiated as distinct nodules that merged to form a thin plasma polymerized coating.