Study of Cathodic Polarization Curves During Pulse Plating of Chromium

作     者：Zhang Hengbin (Department of Chemistry, Jilin University, Changchun)Der-Tau Chin (Department of Chemical Engineering, Clarkson University, Potsdam, New York) Zhang Hengbin (Department of Chemistry, Jilin University, Changchun)Der-Tau Chin (Department of Chemical Engineering, Clarkson University, Potsdam, New York)

出 版 物：《Chemical Research in Chinese Universities》 (高等学校化学研究（英文版）)

年 卷 期：1989年第5卷第4期

页      面：319-324页

核心收录：

学科分类：07[理学] 0703[理学-化学] 

主　　题：Pulse Plating Chromium 

摘      要：A study has been made of the cathodic polarization curves during the pulse plating of chromium from an aqueous chromic acid bath containing 250 g/L CrO3 and 2. 5 g/L H2SO4 at 22℃ over the range of pulse periods from 1 ms to 50 ms. The duty cycle was kept at 50%. The methods of potentiostatic pulse potential control and galvanostatic pulse current control were used to determine the polarization curves of a platinum and a copper rotating disk electrode in the chromium plating solution. The results indicated that pulse potential and pulse current inhibited the formation of a cathode film and shifted the potential of the hydrogen evolution reaction toward the positive direction by about 500 mV. The potential and current pulses behaved as a depolarter of H+ reduction reaction. The present results agreed with a previous experimental observation that the coulombic efficiency of the chromium deposition reaction was reduced and the coulombic efficiency of the hydorgen evolution reaction was increased in pulse plating of chromium.