Dependence of wavDependence of wavefront errors on nonuniformity of thin films

作     者：齐红基 朱美萍 张伟丽 易葵 贺洪波 邵建达 

作者机构：Key Laboratory of Material Science and Technology for High Power Lasers Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences 

出 版 物：《Chinese Optics Letters》 (中国光学快报（英文版）)

年 卷 期：2012年第10卷第1期

页      面：82-85页

核心收录：

学科分类：08[工学] 0803[工学-光学工程] 

基　　金：supported by the National Natural Science Foundation of China under Grant Nos.60878045 and 10976030 

主　　题：Aberrations Errors Film preparation Phase shift Phase shifters Thin films Wavefronts 

摘      要：In contrast to uncoated substrate, a nonlinear relationship of phase shift with the thicknesses of the thin film makes the calculation of wavefront aberration complicated. A program is compiled to calculate the wavefront aberration of multilayer thin film produced by thickness nonuniformity. The physical thickness and the optical phase change on reflection are considered. As an example, the wavefront aberration of the all-dielectric mirror is presented in ArF excimer lithography system with a typical thickness distribution. In addition, the wavefront errors of the thin film at wavelengths of 193 and 633 nm are compared in the one-piece and two-piece arrangements. Results show that the phase shift upon reflection of the thin film produced by thickness nonuniformity is very sensitive to the incident angle, wavelength, and polarization.