Fast and uniform growth of graphene glass using confined-flow chemical vapor deposition and its unique applications

作     者：Zhaolong Chen Baolu Guan Xu-dong Chen Qing Zeng Li Lin Ruoyu Wang Manish Kr. Priydarshi Jingyu Sun Zhepeng Zhang Tongbo Wei Jinmin LI Yanfeng Zhang Yingying Zhang Zhongfan Liu 

作者机构：Center for Nanochemistry (CNC) Beijing Science and Engineering Center for Nanocarbons College of Chemistry and Molecular Engineering Peking University Beijing 100871 China Key Laboratory of Opto-electronics Technology Ministry of Education Beijing University of Technology Beijing 100124 China ing 100083 China Department of Materials Science and Engineering College of Engineering Peking University Beijing 100871 China Department of Chemistry and Center for Nano and Micro Mechanics Tsinghua University Beijing 100084 China 

出 版 物：《Nano Research》 (纳米研究（英文版）)

年 卷 期：2016年第9卷第10期

页      面：3048-3055页

核心收录：

学科分类：081704[工学-应用化学] 07[理学] 08[工学] 0817[工学-化学工程与技术] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 0703[理学-化学] 070301[理学-无机化学] 

基　　金：This work was financially supported by the National Basic Research Program of China (Nos. 2016YFA0200103  2013CB932603  2012CB933404  and 2013CB934600)  the National Natural Science Foundation of China (Nos. 51520105003 and 51432002)  the Ministry of Education (No. 20120001130010)  and the Beijing Municipal Science and Technology Planning Project (No. Z151100003315013) 

主　　题：graphene glass confined-flow chemicalvapor deposition transparent heating device epitaxial A1N film 

摘      要：Fast and uniform growth of high-quality graphene on conventional glass is of great importance for practical applications of graphene glass. We report herein a confined-flow chemical vapor deposition （CVD） approach for the high- efficiency fabrication of graphene glass. The key feature of our approach is the fabrication of a 2-4 μm wide gap above the glass substrate, with plenty of stumbling blocks; this gap was found to significantly increase the collision probability of the carbon precursors and reactive fragments between one another and with the glass surface. As a result, the growth rate of graphene glass increased remarkably, together with an improvement in the growth quality and uniformity as compared to those in the conventional gas flow CVD technique. These high-quality graphene glasses exhibited an excellent defogging performance with much higher defogging speed and higher stability compared to those previously reported. The graphene sapphire glass was found to be an ideal substrate for growing uniform and ultra-smooth aluminum nitride thin films without the tedious pre-deposition of a buffer layer. The presented confined- flow CVD approach offers a simple and low-cost route for the mass production of graphene glass, which is believed to promote the practical applications of various graphene glasses.