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Reaction behavior of trace oxygen during combustion of falling FeSi75 powder in a nitrogen flow

Reaction behavior of trace oxygen during combustion of falling FeSi75 powder in a nitrogen flow

作     者:Bin Li Jun-hong Chen Peng Jiang Ming-wei Yan Jia-lin Sun Yong Li 

作者机构:School of Materials Science and Engineering University of Science and Technology Beijing 

出 版 物:《International Journal of Minerals,Metallurgy and Materials》 (矿物冶金与材料学报(英文版))

年 卷 期:2016年第23卷第8期

页      面:959-965页

核心收录:

学科分类:08[工学] 0817[工学-化学工程与技术] 081701[工学-化学工程] 

基  金:financially supported by the National Nature Science Foundation of China (No.51572019) 

主  题:silicon nitride combustion synthesis oxygen atmosphere 

摘      要:To explore the reaction behavior of trace oxygen during the flash combustion process of falling FeSi75 powder in a nitrogen flow, a flash-combustion-synthesized Fe-Si;N;sample was heat-treated to remove SiO;. The samples before and after the treatment were investigated by X-ray diffraction, scanning electron microscopy, and transmission electron microscopy, and the formation mechanism of SiO;was investigated. The results show that SiO;in the Fe-Si;N;is mainly located on the surface or around the Si;N;particles in dense areas, existing in both crystalline and amorphous states; when the FeSi75 particles, which are less than 0.074 mm in size, fell in up-flowing hot N;stream, trace oxygen in the N;stream did not significantly hinder the nitridation of FeSi75 particles as it was consumed by the surface oxidation of the generated Si;N;particles to form SiO;. At the reaction zone, the oxidation of Si;N;particles decreased the oxygen partial pressure in the N;stream and greatly reduced the opportunity for FeSi75 particles to be oxidized into SiO;; by virtue of the SiO;film developed on the surface, the Si;N;particles adhered to each other and formed dense areas in the material.

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