Space-and time-resolved diagnostics of the ENEA EUV discharge-produced-plasma source used for metrology and other applications

作     者：S.Bollanti P.Di Lazzaro F.Flora L.Mezi D.Murra A.Torre 

作者机构：ENEA FSN-Fusion Physics Division-Radiation Sources Antennas and Diagnostics Laboratory 

出 版 物：《High Power Laser Science and Engineering》 (高功率激光科学与工程（英文版）)

年 卷 期：2015年第3卷第4期

页      面：19-24页

核心收录：

学科分类：080901[工学-物理电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 07[理学] 08[工学] 070204[理学-等离子体物理] 0702[理学-物理学] 

基　　金：partially funded by the Italian Ministry for University and Research(FIRB project no.RBNE01ABPB) the Cariplo Foundation(project no.2012-0816) 

主　　题：discharge produced plasma EUV extreme ultraviolet plasma diagnostics xenon plasma 

摘      要：A discharge-produced-plasma(DPP) source emitting in the extreme ultraviolet(EUV) spectral region is running at the ENEA Frascati Research Centre. The plasma is generated in low-pressure xenon gas and efficiently emits 100-ns duration radiation pulses in the 10–20-nm wavelength range, with an energy of 20 m J/shot/sr at a 10-Hz repetition rate. The complex discharge evolution is constantly examined and controlled with electrical measurements, while a nsgated CCD camera allowed observation of the discharge development in the visible, detection of time-resolved plasmacolumn pinching, and optimization of the pre-ionization timing. Accurately calibrated Zr-filtered PIN diodes are used to monitor the temporal behaviour and energy emission of the EUV pulses, while the calibration of a dosimetric film allows quantitative imaging of the emitted radiation. This comprehensive plasma diagnostics has demonstrated its effectiveness in suitably adjusting the source configuration for several applications, such as exposures of photonic materials and innovative photoresists.