Second Harmonic Generation in Scanning Probe Microscopy for Edge Localization
作者机构：State Key Laboratory of Precision Measurement Technology and InstrumentsDepartment of Precision Instruments and MechanologyTsinghua UniversityBeijing 100084
出 版 物：《Chinese Physics Letters》 (中国物理快报（英文版）)
年 卷 期：2011年第28卷第4期
页 面：91-93页
核心收录：
学科分类：0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学]
基 金：Supported by the National Natural Science Foundation of China under Grant No 50705051
摘 要：We present an approach of second harmonic generation for edge localization of nano-scale defects measurement,based on the impact of the oscillating tip on the sample that induces higher harmonics of the excitation *** harmonic signals of tip motion are measured by the heterodyne *** edge amplitude ratio for the edge characterization can be calculated by a mechanics model and the threshold of edge localization is experimentally determined by second harmonic *** approach has been successfully utilized to measure the pitch of a standard *** results show that the second harmonic is sensitive to locating the edge of nano-scale defects with high accuracy.
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