Thermal stability and sputtering resistance under irradiation of yttria dispersed ferrum films

作     者：LI Zhengcao YU Xiaoyi MIAO Wei ZHANG Zhengjun 

作者机构：State Key Laboratory of New Ceramic and Fine Processing Department of Materials Science and Engineering Tsinghua University Beijing 100084 China 

出 版 物：《Rare Metals》 (稀有金属（英文版）)

年 卷 期：2011年第30卷第3期

页      面：258-261页

核心收录：

学科分类：080503[工学-材料加工工程] 07[理学] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0702[理学-物理学] 

基　　金：support by the National Natural Science Foundation of China (No.61076003) the National Basic Research and Development Program of China (No.2010CB731600 and No.2010CB832900) 

主　　题：ferrum yttria dispersion magnetron sputtering resistance thermal properties irradiation 

摘      要：Oxide dispersion strengthened （ODS） steels are considered as potential candidates for high temperature applications in fusion reactors be-cause of their excellent thermal creep behavior. In the present work, the double-target magnetron co-sputtering method was recommended to prepare yttria dispersed ferrum films. Vacuum annealing and ion irradiation were carried out to study the surface topography and structural features of the prepared yttria dispersed ferrum samples. Experiments proved that while the yttria doping ratio in the ferrum film increases, the recrystallization temperature of the film will be enhanced and the sputtering damage by Xenon ion irradiation will be lowered. The sput-tering resistance of the obtained films would be improved with the growing of grains under vacuum annealing.