Dip-pen刻蚀技术直接构建聚-L-赖氨酸纳米结构
Direct Construction of Poly-L-lysine Nanostructure by Dip-pen Nanolithography作者机构：中国科学院长春应用化学研究所电分析化学国家重点实验室长春130022
出 版 物：《高等学校化学学报》 (Chemical Journal of Chinese Universities)
年 卷 期：2005年第26卷第4期
页 面：757-759页
核心收录：
学科分类：0710[理学-生物学] 071010[理学-生物化学与分子生物学] 081704[工学-应用化学] 07[理学] 08[工学] 0817[工学-化学工程与技术]
主 题：Dip-pen刻蚀技术 聚-L-赖氨酸 纳米结构
摘 要：Dip-pen nanolithography(DPN) has been developed to pattern monolayer film of various molecules in submicrometer dimensions through the controlled movement of ink-coated atomic force microscopy(AFM) tip on a desired substrate, which makes DPN a potentially powerful tool for making the functional nanoscale devices. In this letter, using direct-write dip-pen nanolithography to generate nanoscale patterns of poly-L-lysine on mica was described. Poly-L-lysine molecules can anchor themselves to the mica surface through electrostatic interaction force, so stable poly-L-lysine patterns, such as square, line, circle and cross, could be obtained on freshly cleaved mica surface. From AFM image of the patterned poly-L-lysine nanostructures on mica, we know that poly-L-lysine was flatly bound to the mica surface. These oriented patterns of poly-L-lysine on mica can provide the prospect of building functional nanodevices and offer new options for this technique in a variety of other significant biomolecules.
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