Growth process,defects,and dopants of bulkβ-Ga_(2)O_(3)semiconductor single crystals
作者机构:School of Materials Science and EngineeringTsinghua UniversityBeijing 100084China Key Laboratory for Advanced Materials Processing Technology(Ministry of Education)Beijing 100084China
出 版 物:《China Foundry》 (中国铸造(英文版))
年 卷 期:2024年第21卷第5期
页 面:491-506页
核心收录:
学科分类:07[理学] 0806[工学-冶金工程] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程(可授工学、理学学位)] 0703[理学-化学] 0702[理学-物理学]
基 金:Ministry of Education, MOE Chinese Mechanical Engineering Society
主 题:β-Ga_(2)O_(3) single-crystal growth defects dopants semiconductor
摘 要:β-gallium oxide(β-Ga2O3),as the typical representative of the fourth generation of semiconductors,has attracted increasing attention owing to its ultra-wide bandgap,superior optical properties,and excellent tolerance to high temperature and *** to the single crystals of other semiconductors,high-quality and large-sizeβ-Ga_(2)O_(3)single crystals can be grown with low-cost melting methods,making them highly *** this review,the growth process,defects,and dopants ofβ-Ga_(2)O_(3)are primarily ***,the growth process(e.g.,decomposition,crucible corrosion,spiral growth,and development)ofβ-Ga_(2)O_(3)single crystals are summarized and compared in ***,the defects ofβ-Ga_(2)O_(3)single crystals and the influence of defects on Schottky barrier diode(SBD)devices are emphatically ***,the influences of impurities and intrinsic defects on the electronic and optical properties ofβ-Ga_(2)O_(3)are also briefly *** this comprehensive analysis,the article offers a concise summary of the current state,challenges and prospects ofβ-Ga_(2)O_(3)single crystals.