Effect of trace oxygen on plasma nitriding of titanium foil

作     者：周海涛 熊希雅 马可欣 罗炳威 罗飞 申承民 Hai-Tao Zhou;Xi-Ya Xiong;Ke-Xin Ma;Bing-Wei Luo;Fei Luo;Cheng-Min Shen

作者机构：Beijing Institute of Aeronautical MaterialsAero Engine Corporation of ChinaBeijing 100095China Beijing National Laboratory of Condensed Matter PhysicsInstitute of PhysicsChinese Academy of SciencesBeijing 100190China 

出 版 物：《Chinese Physics B》 (中国物理B（英文版）)

年 卷 期：2024年第33卷第6期

页      面：548-551页

核心收录：

学科分类：07[理学] 070204[理学-等离子体物理] 0702[理学-物理学] 

基　　金：Project supported by the Innovation Funding of Beijing Institute of Aeronautical Materials 

主　　题：nitride oxide nanostructure crystalline plasma-enhanced chemical vapor deposition system(PECVD) 

摘      要：Titanium nitride films are prepared by plasma enhanced chemical vapor deposition method on titanium foil using N_(2) as precursor. In order to evaluate the effect of oxygen on the growth of titanium nitride films, a small amount of O_(2) is introduced into the preparation process. The study indicates that trace O_(2) addition into the reaction chamber gives rise to significant changes on the color and micro-morphology of the foil, featuring dense and long nano-wires. The as-synthesized nanostructures are characterized by various methods and identified as TiN, Ti_(2) N, and TiO_(2) respectively. Moreover, the experiment results show that oxide nanowire has a high degree of crystallinity and the nitrides present specific orientation relationships with the titanium matrix.