Effect of trace oxygen on plasma nitriding of titanium foil
作者机构:Beijing Institute of Aeronautical MaterialsAero Engine Corporation of ChinaBeijing 100095China Beijing National Laboratory of Condensed Matter PhysicsInstitute of PhysicsChinese Academy of SciencesBeijing 100190China
出 版 物:《Chinese Physics B》 (中国物理B(英文版))
年 卷 期:2024年第33卷第6期
页 面:548-551页
核心收录:
学科分类:07[理学] 070204[理学-等离子体物理] 0702[理学-物理学]
基 金:Project supported by the Innovation Funding of Beijing Institute of Aeronautical Materials
主 题:nitride oxide nanostructure crystalline plasma-enhanced chemical vapor deposition system(PECVD)
摘 要:Titanium nitride films are prepared by plasma enhanced chemical vapor deposition method on titanium foil using N_(2) as precursor. In order to evaluate the effect of oxygen on the growth of titanium nitride films, a small amount of O_(2) is introduced into the preparation process. The study indicates that trace O_(2) addition into the reaction chamber gives rise to significant changes on the color and micro-morphology of the foil, featuring dense and long nano-wires. The as-synthesized nanostructures are characterized by various methods and identified as TiN, Ti_(2) N, and TiO_(2) respectively. Moreover, the experiment results show that oxide nanowire has a high degree of crystallinity and the nitrides present specific orientation relationships with the titanium matrix.