Electromagnetic modeling of interference,confocal,and focus variation microscopy
作者机构：University of KasselFaculty of Electrical Engineering and Computer ScienceMeasurement Technology GroupKasselGermany
出 版 物：《Advanced Photonics Nexus》 (先进光子学通讯（英文）)
年 卷 期：2024年第3卷第1期
页 面：104-116页
学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学]
基 金：support of the following research Projects (Nos.GZ:LE 992/14-3 and LE 992/18-1)by the Deutsche Forschungsgemeinschaft and the EMPIR program (project TracOptic 20IND07)co-financed by the European Union’s Horizon 2020 Research and Innovation Program
主 题：interference microscopy coherence scanning interferometry confocal microscopy focus variation microscopy electromagnetic modeling surface topography measurement
摘 要：We present a unified electromagnetic modeling of coherence scanning interferometry,confocal microscopy,and focus variation microscopy as the most common techniques for surface topography inspection with micro-and nanometer *** model aims at analyzing the instrument response and predicting systematic *** the main focus lies on the modeling of the microscopes,the light–surface interaction is considered,based on the Kirchhoff approximation extended to vectorial imaging ***,it can be replaced by rigorous methods without changing the microscope *** demonstrate that all of the measuring instruments mentioned above can be modeled using the same theory with some adaption to the respective *** validation,simulated results are confirmed by comparison with measurement results.
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