40-meter-long REBCO tapes with critical current over 4,000 A/12 mm at 4.2 K and 13 T by advanced MOCVD

作     者：Mahesh Paidpilli Chirag Goel Bhabesh Sarangi Siwei Chen Eduard Galstyan Jan Jaroszynski Griffin Bradford Dmytro Abraimov Venkat Selvamanickam 

作者机构：Department of Mechanical EngineeringAdvanced Manufacturing InstituteTexas Center for SuperconductivityUniversity of HoustonHoustonTexasUSA AMPeers LLCHoustonTexasUSA National High Magnetic Field LaboratoryTallahasseeFloridaUSA 

出 版 物：《Superconductivity》 (超导（英文）)

年 卷 期：2024年第9卷第1期

页      面：29-34页

核心收录：

学科分类：080801[工学-电机与电器] 0808[工学-电气工程] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 

基　　金：funded by awards DE‐EE0007869 from the Department of Energy Advanced Materials and Manufacturing Technology Office and DE‐SC0016220 from the Department of Energy Office of Science The measurements at NHMFL,Tallahassee was supported by NSF award DMR‐1644779 

主　　题：High‐temperature superconductors MOCVD REBCO Critical current 

摘      要：REBa_(2)Cu_(3)O_(7−δ)(REBCO,RE=rare earth)tapes doped with 5%and 15%Zr have been scaled up to lengths more than 40 m in a pilot‐scale advanced metal organic chemical vapor deposition(A‐MOCVD)*** precursor compositions used for the long tapes were guided by a study of the influence of(Ba+dopant)/Cu content on the critical current density(Jc)of 5 and 15 mol.%Hf‐and Zr‐added tapes at 4.2 K and 13 *** 40‐mlong tapes exhibited a critical current(Ic)over 4,000 A/12 mm at 4.2 K and 13 T as well as over 1,400 A/12 mm at 20 K and 20 *** critical current densities of a 40‐m‐long tape doped with 5%Zr at 4.2 K measured at the National High Magnetic Field Laboratory(NHMFL)were10 MAcm^(−2)and5 MAcm^(−2)at 14 T and 30 T,respectively,which are over three times those of commercial REBCO *** infield Jc of 5%Zradded 40‐m‐long tapes was similar to those of previously‐reported high‐performance short samples made with 15%Zr or *** results demonstrate the excellent potential of A‐MOCVD for manufacturing high Ic REBCO tapes for use in ultrahigh‐field magnet applications.