Deterministic Dual Control of Phase Competition in Strained BiFeO_(3):A Multiparametric Structural Lithography Approach
作者机构:School of Maths and PhysicsQueen's University BelfastBelfast BT7 INNUK School of ChemistryUniversity of St.AndrewsSt Andrews KY169STUK School of PhysicsUniversity College DublinBelfieldDublin 4Ireland
出 版 物:《Nanomanufacturing and Metrology》 (纳米制造与计量(英文))
年 卷 期:2022年第5卷第1期
页 面:60-66页
核心收录:
学科分类:08[工学] 0805[工学-材料科学与工程(可授工学、理学学位)] 080502[工学-材料学]
基 金:UK Research and Innovation,MR/T043172/1 Raymond G.P.McQuaid Department for Employment and Learning,Northern Ireland,USI-082 Amit Kumar Engineering and Physical Sciences Research Council,EP/S037179/1 Amit Kumar EP/LO15323/01,Nathan Black.
主 题:Phase competition Ferroelectric Stress Lithography
摘 要:The realization of a mixed-phase microstructure in strained BiFeO_(3)(BFO)thin films has led to numerous novel effects derived from the coexistence of the tetragonal-like monoclinic phase(T phase)and rhombohedral-like monoclinic phase(R phase).Strong strain and polarization diiferences between the phases should result in a high level of transformation plasticity,which enables the continuous alteration of the relative proportion of R and T states in response to external forces.Although the potential for utilizing such plasticity to control mixed-phase populations under external stimuli is evident,direct experi・mental evidence backed by equilibrium predictions has not yet been fully demonstrated.Here we demonstrate deterministic control of mixed-phase populations in an epitaxially strained BFO thin film through the application of localized stresses and electric fields in a reversible manne匚The results illustrate and rationalize deterministic control of mixed phases in strained BFO films,which could be crucial in tuning their functional properties.The findings also highlight a new multiparametric technique in the scanning probe lithography toolbox based on tip-assisted electric and strain field manipulation of functional properties that might find application beyond the ferroelectric domain and structural phase lithography.