Scanning and Splicing Atom Lithography for Self-traceable Nanograting Fabrication
作者机构：MOE Key Laboratory of Advanced Micro-Structured MaterialsTongji UniversityShanghai200092China Institute of Precision Optical EngineeringSchool of Physics Science and EngineeringTongji UniversityShanghai200092China
出 版 物：《Nanomanufacturing and Metrology》 (纳米制造与计量（英文）)
年 卷 期：2022年第5卷第2期
页 面：179-187页
核心收录：
学科分类：080903[工学-微电子学与固体电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学]
基 金：supported by Significant Development Project of Shanghai Zhangjiang National Innovation Benchmarking Zone(Grant No.ZJ2021-ZD-008) National Natural Science Foundation of China(Grant No.62075165) Science and Technology Commission of Shanghai(Grant No.208014043) Shanghai Municipal Science and Technology Major Project(2021SHZDZX0100) the Fundamental Research Funds for the Central Universities Opening Fund from Shanghai Key Laboratory of Online Detection and Control Technology of SIMT
主 题：Scanning atom lithography Splicing atom lithography Nanograting Self-traceability Dove prism
摘 要：Atom lithography is a unique method to fabricate self-traceable pitch standards and angle standards,but extending its structure area to millimeter-level for application is *** this paper,on the one hand,we put forward a new approach to fabricate a full-covered self-traceable Cr nanograting by inserting and scanning a Dove prism in the Gaussian beam direction of atom *** the other hand,we extend the structure area along the standing-wave direction by splicing two-step atom *** nanostructures manufactured via scanning atom lithography and splicing atom lithography demonstrate good pitch accuracy,parallelism,continuity,and homogeneity,which opens a new way to fabricate centimeter-level full-covered self-traceable nanograting and lays the basis for the application of square ruler and optical encoders at the nanoscale.
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