Structure Characterization of F-doped Silica Glass

作     者：谢峻林 邓涛 XIE Junlin1, DENG Tao1, TU Feng2, LUO Jie2, HAN Qingrong 2 (1. Key Laboratory for Silicate Materials Science and Engineering of Ministry of Education, Wuhan University of Technology, Wuhan 430070, China;2. Yangtze Optical Fibre and Cable Company Ltd., Wuhan 430073, China)

作者机构：Key Laboratory for Silicate Materials Science and Engineering of Ministry of EducationWuhan University of Technology 

出 版 物：《Journal of Wuhan University of Technology(Materials Science)》 (武汉理工大学学报（材料科学英文版）)

年 卷 期：2009年第24卷第1期

页      面：137-139页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 

主　　题：silica glass fluorine PCVD incorporation form 

摘      要：Pure and fluorine-doped silica glass were fabricated by plasma chemical vapour deposition （PCVD） and characterized using Raman and infrared spectrum. The change in Raman intensity of 945 cm-1 peak, relating to ≡Si-F stretching vibration, agrees with the change of F content. Compared with measured wavenumber in IR spectrum, the calculated absorption wavelength confirms the incorporation form of F into the glass, the detail of which is a tetrahedron with a Si atom in the center coupled with one F atom and three network O atoms. Such structure identification may be useful for explaining some properties of F-doping silica glass.