A silicon-graphene-silicon transistor with an improved current gain
A silicon-graphene-silicon transistor with an improved current gain作者机构:Shenyang National Laboratory for Materials ScienceInstitute of Metal ResearchChinese Academy of Sciences72 Wenhua RoadShenyang 110016China School of Material Science and EngineeringUniversity of Science and Technology of China72 Wenhua RoadShenyang 110016China
出 版 物:《Journal of Materials Science & Technology》 (材料科学技术(英文版))
年 卷 期:2022年第104卷第9期
页 面:127-130页
核心收录:
学科分类:080903[工学-微电子学与固体电子学] 081702[工学-化学工艺] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 0817[工学-化学工程与技术] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程(可授工学、理学学位)] 080502[工学-材料学]
基 金:supported by National Natural Science Foundation of China(Nos.62074150,61704175) Chinese Academy of Sciences(SYNL Young Talent Project 2020,SKLA-2019-03,Project Young Merit Scholars)
主 题:Semiconductor metal semiconductor transistor Graphene base transistor Graphene base heterojunction transistor
摘 要:In history,semiconductor-metal-semiconductor transistor(SMST)was proposed for frequency ***,a general fabrication method is still missing due to the unsolved technological problem of deposition of a general crystalline semiconductor on metal,and a thinner metal base is also difficult to be fabricated with high ***,due to the atomic thickness of graphene,the concept of semiconductor-graphene-semiconductor transistor(SGST)has emerged which leads to the renaissance of SMST,however the experimental study is in its *** this letter,SMST and SGST are fabricated using Si membrane *** is found the common base current gain can be improved from about 0.5%in a Si-Au-Si transistor to about 1%in a Si-Gr-Ge one,and to above 10%in a Si-Gr-Si one,which is attributed to both the ultra-thin thickness and the quantum capacitance effect of graphene.