Theoretical analysis of thermal/electric-filed poling silica glass

作     者：刘雪明 郑小平 郭奕理 张汉一 李艳和 

作者机构：Department of Electronic Engineering Tsinghua University Beijing China 

出 版 物：《Science China(Technological Sciences)》 (中国科学（技术科学英文版）)

年 卷 期：2002年第45卷第6期

页      面：646-653页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 

主　　题：silica, second-order nonlinearity, thermal/electric-field poling, carrier. 

摘      要：Based on the experimental results, three basic conclusions are summarized for the thermal/electric-field poling (TEFP) silica materials, with which the second-order nonlinear optical coefficient in the bulk silica glass after TEFP is calculated, and relationships between the coefficient and the applied voltage V 0 in the poling process and the thickness of the nonlinear layer created from the poling are obtained. Theoretical results show that the second-order susceptibility χ(2) and the second-harmonic efficiency η in the poled bulk glass are proportional to √V 0 and V 0 2 , respectively; χ(2)～0.2?1.6 pm/V for the bulk glass after the typical TEFP; χ(2) decreases with an increase in the poling time after the TEFP silica glass approximately reaches the steady state. Theoretical results are well consistent with the experimental reports.