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COMPARISON OF MATERIAL FOR ENCAPSULATING MINIMODULES

Acta Metallurgica Sinica(English Letters) 2005年第3期18卷 380-384页

作者： Z.Zhang H.Shen X.Q.Xu W.Chen GuangzhouInstituteofEnergyConversion TheChineseAcademyofSciencesGuangzhou510070China GuangzhouInstituteofEnergyConversion TheChineseAcademyofSciencesGuangzhou510070China／／TheSchoolofPhysicsandEngineeringZhongshanUniversityGuangzhou510640China

The main characteristics of glass, polymethyl methacrylate (PMMA) and polycarbon ate (PC) were presented. The transmittance of glass, PMMA and PC was measured by the UV-VIS spectroscopy analysis. PMMA and PC have the advantages of higher tra nsparency, higher resistance and lower density. It is indicated that both PMMA a nd PC are suitable for encapsulating solar minimodules.

关键词： solar module PMMA PC encapsulate

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ISOTROPIC TEXTURING OF POLYCRYSTALLINE SILICON WAFERS

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Acta Metallurgica Sinica(English Letters) 2005年第3期18卷 269-274页

作者： L.Wang H.Shen YF.Hu GuangzhouInstituteofEnergyConversion TheChineseAcademyofSciencesGuangzhou510640China GuangzhouInstituteofEnergyConversion TheChineseAcademyotSciencesGuangzhou510640China／／TheSchoolofPhysicsandEngineeringZhongshanUniversityGuangzhou510275China CollegeofMechanicalEngineering SouthChinaUniversityofTechnologyGuangzhou510640China

An isotropic etching technique of texturing silicon solar cells has been applied to polycrystalline silicon wafers with different acid concentrations. Optimal e tching conditions have been determined by etching rate calculation, scanning ele ctron microscope (SEM) image and reflectance measurement. The surface morphology of the textured wafers varies in accordance with the different etchant concentr ation which in turn leads to the dissimilarity of etching speed. Textured polycr ystalline silicon wafer surfaces display randomly located etched pits which can reduce the surface reflection and enhance the light absorption. The special rela tionship between reflectivity and etching rate was studied. Reflectance measurem ents show that isotropic texturing is one of the suitable techniques for texturi ng polycrystalline silicon wafers and benefits solar cells performances.

关键词： texturing light trapping poly-Si reflectance

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OPTICAL CHARACTERIZATION OF TiO_2 THIN FILM ON SILICON SUBSTRATE DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING

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Acta Metallurgica Sinica(English Letters) 2005年第3期18卷 194-198页

作者： H.Q.Wang H.Shen D.C.Ba B.W.Wang L.S.Wen D.Chen SchoolofMechanismandAutomobile ShenyangInstituteofAeronauticalEngineeringShenyang110034Ghina／／MechanismandAeronauticalCollegeNortheasternUniversityShenyang110004China theschoolofphysicsandengineering ZhongshanUniversityGuangzhou510275Ghina MechanismandAeronauticalCollege NortheasternUniversityShenyang110004China GuangzhouInstimdeofEnergyConversion Guangzhou510070China InstituteofMetalResearch TheChineseAcademyofSciencesShenyang110016China MaterialandScienceEngineeringAcademy SouthChinaUniversityofTechnologyGuangzhou510641China

TiO2 thin film has attracted considerable attention in recent years, due to its different refractive index and transparency with amorphous and different crysta ls in the visible and near-infrared wavelength region, high dielectric constant, wide band gap, high wear resistance and stability, etc, for which make it being used in many fields. This paper aims to investigate the optical characterizatio n of thin film TiO2 on silicon wafer. The TiO2 thin films were prepared by DC re active magnetron sputtering process from Ti target. The reflectivity of the film s was measured by UV-3101PC, and the index of refraction (n) and extinction coef ficient (k) were measured by n & k Analyzer 1200.

关键词： optical characterization TiO2 thin film DC reactive magnetron sputtering n & k

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