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Effects of Pulsation on Separated Flow and Heat Transfer in Enlarged Channel

Journal of Thermal Science 2011年第1期20卷 70-75页

作者： Hiroyuki YOSHIKAWA Tomonori KAI Mizue MUNEKATA Hideki OHBA Dept.of Mechanical System Engineering Kumamoto University2-39-1 KurokamiKumamoto 860-8555Japan Graduate School of Science and Technology Kumamoto University2-39-1 KurokamiKumamoto 860-8555Japan kikuyo KikuchiKumamoto 869-1101Japan

Numerical results of three-dimensional separated flow and heat transfer in an enlarged rectangular channel are presented in this *** expansion ratio and aspect ratio of the channel are 2.0 and 16.0,*** number of the flow is 200 and it is over the critical Reynolds *** the critical Reynolds number,the flow in the symmetric channel becomes asymmetric and deflects to one side of the *** of the pulsating fluctuation at the inlet upon the flow in the channel are *** is clarified that the inlet flow with a pulsating fluctuation of Strouhal number 0.05 and 0.10 strongly affects on the flow in the channel,and heat transfer on the walls is enhanced,especially on the wall surface covered with long separation *** the other hand,the pulsation of St=0.0125 oscillates the shear layer more weakly than that of St=0.05,0.10 and the enhancement of heat transfer is smaller,though some vortices are shed from the vicinity of the side wall near the reattachment *** oscillation of the main flow calms down gradually as the Strouhal number of the pulsation increases over *** influence of pulsation of St=0.20 on the flow is restricted in the near downstream of the step,and heat transfer on the walls is almost similar to that of the steady flow in the channel.

关键词： Pulsating Fluctuation Symmetric Enlarged Channel Separated Flow Heat Transfer

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Drying of Flowing Liquid Film on Rotating Disk

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Journal of Thermal Science 2010年第3期19卷 234-238页

作者： Mizue MUNEKATA Jun NISHIYAMA Akira NOGUCHI Hiroaki KURISHIMA Hiroyuki YOSHIKAWA Hideki OHBA Department of Mechanical System Engineering Kumamoto University2-39-1 KurokamiKumamoto 860-8555Japan Graduate School of Science and Technology Kumamoto University Tokyo Electron Kyushu LTD. 1-1 FukuharaKoshiKumamoto 861-1116Japan kikuyo Kumamoto 869-1101Japan

Recently,development of high technology has been required for the formation of uniform thin film in manufacturing processes of semiconductor as the precision instruments become more sophisticated.A method called spin coating is often used for spreading photoresist on a wafer surface and drying photoresist *** spin coating process,photoresist is uniformly spread on the wafer surface by centrifugal force caused by rotating ***,it is a serious concern that streaky lines,which are caused by spiral vortices,appear on the wafer surface and prevent the formation of uniform film in the case of high rotating *** the other hand,in the case of low rotating speed,a small hump of the film is formed near the wafer *** main purpose of this study is to make clear the drying characteristics of the flowing liquid film on the rotating *** distribution of the flowing liquid film is captured by an infrared thermal video camera and radial gradient of the film temperature is introduced in order to evaluate the drying characteristic of the flowing film under steady state *** of the flow rate of the liquid film on the film temperature are *** film temperature gradually decreases in the radial direction in all *** low rotating speed,the radial gradient of the film temperature is almost constant *** the other hand,at high rotating speed,the radial gradient of the film temperature takes a certain maximum *** is found that the location of the gradient peak corresponds with the transition region of the air boundary layer,in which spiral vortices swirl,and shifts to the inner side of the disk with an increase of the liquid flow rate.

关键词： Spin coating Drying characteristic Liquid film flow Air boundary layer Spiral vortex

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