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Semitransparent Organic Solar Cells with Superior Thermal/Light Stability and Balanced Efficiency and Transmittance

Energy & Environmental Materials 2024年第4期7卷 215-222页

作者： Zhipeng Yin Huan Zhao Yang Liu Xunwen Xiao Yong Zhang Huahang Lai Ning Li Hai-Qiao Wang School of Materials Science and Engineering Ningbo Tech University State Key Laboratory of Luminescent Materials and Devices Institute of Polymer Optoelectronic Materials and Devices School of Materials Science and Engineering South China University of Technology Ningbo University of Technology Ningbo Institute of Technology Beihang University hangna nanofabrication equipment co. Ltd.

Semitransparent organic solar cells show attractive potential in the application of building-integrated photovoltaics,agrivoltaics,floating photovoltaics,and wearable electronics,as their multiple functionalities of e... 详细信息

关键词： organic solar cell semitransparent thermal/light stability

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Snapshot Mueller spectropolarimeter imager

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Microsystems & Nanoengineering 2023年第5期9卷 271-279页

作者： Tianxiang Dai Thaibao Phan Evan W.Wang Soonyang Kwon Jaehyeon Son Myungjun Lee Jonathan A.Fan Department of Electrical Engineering Stanford UniversityStanfordCA 94305USA equipment R&D Team 4 Mechatronics ResearchSamsung Electronics Co.LtdGyeonggi-do 18848Republic of Korea

We introduce an imaging system that can simultaneously reco.d co.plete Mueller polarization responses for a set of wavelength channels in a single image *** division-of-focal-plane co.cept co.bines a multiplexed illumination scheme based on Fourier optics together with an integrated telesco.ic light-field imaging ***-resolved imaging is achieved using broadband nanostructured plasmonic polarizers as functional pinhole *** reco.ding of polarization and wavelength information on the image sensor is highly *** also develop a calibration approach based on a customized neural network architecture that can produce calibrated measurements in *** a proof-of-co.cept demonstration,we use our calibrated system to accurately reco.struct a thin film thickness map from a four-inch *** anticipate that our co.cept will have utility in metrology,machine vision,co.putational imaging,and optical co.puting platforms.

关键词： polarization image Snapshot

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Tip-and Laser-based 3D nanofabrication in Extended Macrosco.ic Working Areas

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Nanomanufacturing and Metrology 2021年第3期4卷 132-148页

作者： Ingo Ortlepp Thomas Frohlich Roland FuBl Johann Reger Christoph Schaffel Stefan Sinzinger Steffen Strehle ReneTheska Lena Zentner Jens-Peter Zollner Ivo WRangelow Carsten Reinhardt Tino Hausotte Xinrui Cao Oliver Dannberg Florian Fern David Fischer Stephan Gorges Martin Hofmann Johannes Kirchner Andreas Meister Taras Sasiuk Ralf Schienbein Shraddha Supreeti Laura Mohr-Weidenfeller Christoph Weise Christoph Reuter Jaqueline Stauffenberg Eberhard Manske Institute of Process Measurement and Sensor Technology Technische Universitat IlmenauEhrenbergstrasse 2998693 IlmenauGermany co.trol Engineering Group Technische Universitat IlmenauIlmenauGermany Optical Engineering Group.Technische Universitat Ilmenau IlmenauGermany Microsystems Technology Group.Technische Universitat Ilmenau IlmenauGermany Precision Engineering Group.Technische Universitat Ilmenau IlmenauGermany co.pliant Systems Group Technische Universitat IlmenauIlmenauGermany Micro-and Nanoelectronic Systems Group Technische Universitat IlmenauIlmenauGermany Nanoscale Systems Group.Technische Universitat Ilmenau IlmenauGermany Division for Research Service and Technology Transfer Technische Universitat IlmenauIlmenauGermany Electronics Technology Group.Technische Universitat Ilmenau IlmenauGermany IMMS Institut flir Mikroelektronik-und Mechatronik-Systeme Gemeinniitzige GmbH(IMMS GmbH) IlmenauGermany Fachgebiet Technische Physik City University of Applied SciencesBremenGermany Lehrstuhl fiir Fertigungsmesstechnik Friedrich-Alexander-U niversitat(FAU)Erlangen-NiirnbergGermany JUMO GmbH&co.KG FuldaGermany Aspherico. GmbH JenaGermany

The field of optical lithography is subject to intense research and has gained enormous ***,the effort necessary for creating structures at the size of 20 nm and below is co.siderable using co.ventional *** effort and the resulting financial requirements can only be tackled by few global co.panies and thus a paradigm change for the semico.ductor industry is co.ceivable:custom design and solutions for specific applications will dominate future development(Fritze in:Panning EM,Liddle JA(eds)Novel patterning *** society for optics and ***,Bellingham,***://***/10.1117/12.2593229).For this reason,new aspects arise for future lithography,which is why enormous effort has been directed to the development of alternative fabrication ***,the technologies emerging from this process,which are promising for co.ing with the current resolution and accuracy challenges,are only demonstrated as a proof-of-co.cept on a lab scale of several square *** scale is not adequate for the requirements of modern lithography;therefore,there is the need for new and alternative cross-scale solutions to further advance the possibilities of unco.ventional *** challenges arise because of the technical progress in various other fields,realizing new and unique functionalities based on nanoscale effects,e.g.,in nanophotonics,quantum co.puting,energy harvesting,and life *** platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks,which are available at the Technische Universitiit Ilmenau in the form of nanopositioning and nanomeasuring(NPM)*** this equipment,the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimete

关键词： Nanomeasuring Nanopositioning Nanomanufacturing Scale-spanning Tip-based Laser-based nanofabrication

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