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Modulation of the plasma uniformity by coil and dielectric window structures in an inductively coupled plasma

Plasma Science and Technology 2021年第9期23卷 111-122页

作者： Xiaoyan SUN Yuru ZHANG Jing YE Younian WANG Jianxin HE Textile and Garment Industry of Research In stitute Zhongyuan University of Tech no logyZhengzhou 450007.People's Republic of China Key Laboratory of Materials Modification by Laser Ion and Electron Beams(Ministry of Education)School of PhysicsDalian University of TechnologyDalian 116024People's Republic of China School of Textiles Zhongyuan University of Technology.Zhengzhou 450007People's Republic of China

The effects of coil and dielectric window structures on the plasma distribution are examined in a cylindrically symmetric planar inductively coupled plasma(ICP).A two-dimensional(2 D)fluid model is employed to investigate the design issues of ICP source for *** the gradient coil structure is applied at 400 W and 20 mTorr,the ionization rate caused by the power deposition decreases at the reactor center as compared to that in a reactor with a planar coil above the planar dielectric window,and a rather uniform plasma is ***,for the vertical coil geometry,all the coils move to the position of the outermost coil,and the peaks of the power deposition and ionization rate appear at the radial edge of the *** this case,the plasma density is characterized by an edge-high ***,it is observed that the plasma uniformity is improved by increasing the source power under a gas pressure of 20 mTorr and becomes better when the gas pressure increases to 30 mTorr with the source power being fixed at400 W in the gradient coil configuration,but the uniformity of plasma worsens with the rising source power or pressure due to the strong localization in the vertical coil ***,when the discharge is sustained in a reactor with a stepped dielectric window at r=0.135 m,the best plasma uniformity is obtained at 400 W and 20 m Torr because the ionization rate is enhanced at the outermost coil,and the dielectric window at r=0.135 m blocks the diffusion of plasma towards the *** addition,higher source power and lower gas pressure produce more uniform plasma for the designs with a stepped window near the symmetry *** the dielectric window is stepped at r=0.135 m,the non-uniformity of plasma initially decreases and then increases with the increase in source power or gas *** the dielectric window is stepped at the radial edge of the chamber,the plasma uniformity is improved by increasing the source power and gas pressure due t

关键词： fluid simulation gradient coil vertical coil stepped dielectric window plasma uniformity

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