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The conductive mechanisms of a titanium oxide memristor with dopant drift and a tunnel barrier

Chinese Physics B 2013年第8期22卷 712-720页

作者：田晓波徐晖李清江 Embedded System and Solid-State Engineering Technology Center School of Electronic Science and Engineering National University of Defense and Technology

Nano-scale titanium oxide memristors exhibit complex conductive characteristics, which have already been proved by existing research. One possible reason for this is that more than one mechanism exists, and together they codetermine the conductive behaviors of the memristor. In this paper, we first analyze the theoretical base and conductive process of a memristor, and then propose a compatible circuit model to discuss and simulate the coexistence of the dopant drift and tunnel barrier-based mechanisms. Simulation results are given and compared with the published experimental data to prove the possibility of the coexistence. This work provides a practical model and some suggestions for studying the conductive mechanisms of memristors.

关键词： memristor conductive mechanism dopant drift tunnel barrier

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Vertical SnS2/Si heterostructure for tunnel diodes

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Science China(Information Sciences) 2020年第2期63卷 189-195页

作者： Rundong JIA Qianqian HUANG Ru HUANG Key Laboratory of Microelectronic Devices and Circuits (MOE) Institute of Microelectronics Peking University

tunneling FET（TFET） is considered as one of the most promising low-power electronic devices,however, suffers from the low drive current. Heterostructure TFET with low effective tunnel barrier height based on traditional 3D materials can obtain large tunnel current but deteriorated off-state current induced by the lattice mismatch. van der Waals heterostructure TFET based on 2D materials can obtain danglingbond-free interface for suppressed off-state current but face the challenge of controllable and stable doping technology. As the critical building block of the TFET, tunnel diode based on the 2D/3D heterostructure is proposed in this study and experimentally demonstrated. Combination of the pristine interface of 2D materials and matured doping technology in the traditional 3D bulk materials, tunnel diodes based on the 2D/3D heterostructures are expected to realize low leakage current and high on current simultaneously,showing great potential in low-power electronics. The N+SnS2/P+Si heterostructure with effective tunnel barrier of 0.17 eV theoretically is considered for the first time and selected as the optimal material platform for tunnel diodes. The N+SnS2/P+Si tunnel diode demonstrated experimentally shows the high current density of 1 μA/μm2, which is the highest one among the reported tunnel diodes based on the 2D/group IV materials. The tunneling current is also confirmed by low-temperature measurements. This study shows the great potential of the 2D/3D heterostructure for low-power tunneling devices.

关键词： 2D/3D heterostructure SnS2/Si tunnel barrier tunnel diode energy-efficient

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tunnel magnetoresistance with atomically thin two- dimensional hexagonal boron nitride barriers

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Nano Research 2015年第4期8卷 1357-1364页

作者： Andre Dankert M. Venkata Kamalakar Abdul Wajid R. S. Patel Saroj P. Dash Department of Microtechnology and Nanoscience Chalmers University of Technology SE-41296 Goteborg Sweden Department of Physics Birla Institute of Technology and Science Pilani--K K Birla Goa Campus Zuarinagar-403 726 Goa India

The two-dimensional atomically thin insulator hexagonal boron nitride （h-BN） constitutes a new paradigm in tunnel based devices. A large band gap, along with its atomically flat nature without dangling bonds or interface trap states, makes it an ideal candidate for tunnel spin transport in spintronic devices. Here, we demonstrate the tunneling of spin-polarized electrons through large area monolayer h-BN prepared by chemical vapor deposition in magnetic tunnel junctions. In ferromagnet/h-BN/ferromagnet heterostructures fabricated on a chip scale, we show tunnel magnetoresistance at room temperature. Measurements at different bias voltages and on multiple devices with different ferromagnetic electrodes establish the spin polarized tunneling using h-BN barriers. These results open the way for integration of 2D monolayer insulating barriers in active spintronic devices and circuits operating at ambient temperature, and for further exploration of their properties and prospects.

关键词： hexagonal boron nitride 2D layered materials CVD spintronics magnetic tunnel junction tunnel magnetoresistance tunnel barrier

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