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Investigation on resist development rate model for synchrotron radiation X-ray lithography

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Chinese Science Bulletin 1995年第10期40卷 861-864页

作者：谢常青陈梦真王玉玲孙宝银周生辉朱樟震 Microelectron R & D Centre Chinese Academy of Sciences Beijing 100010 China Institute of High Energy Physics Chinese Academy of Sciences Beijing 100039 China

Since the synchrotron radiation X-ray lithography (SRXRL) was put forward, it hascaught many people’s attention day after day. It has much benefit, such as high-structuralresolution, large process window, high throughput. It is generally thought a very goodlithography technique when dimensions shrink to 0.25μm and below. Because of the im-

关键词： synchrotron radiation X-ray lithography resist development rate model Marquardt method.

ENERGY DEPOSITION AND DISTRIBUTION WITHIN resist FILM IN ELECTRON BEAM LITHOGRAPHY

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Chinese Science Bulletin 1986年第15期31卷 1023-1029页

作者：宋传杰裘培勇何延才 Laboratory of Electron Beam Shandong Engineering Institute Ji'nan Shanghai Institute of Ceramics Academia Sinica.INTRODUCTION Electron beam lithography (EBL)is one of the most important methods to fabricate a submicron VLSI device. The ultimate resolution of EBL is limited by electron scattering in resist film and substrate (Fig. 1). E-beam irradiation changes

*** Electron beam lithography (EBL)is one of the most important methods to fabricate a submicron VLSI device. The ultimate resolution of EBL is limited by electron scattering in resist film and substrate (Fig. 1). E-b... 详细信息

关键词： lithography irradiation Electron fabricate resist ultimate desired proximity BEAM verified

bell hooks: To resist Misrepresentations of the Outlaw Culture

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海外英语 2012年第4X期 3-5页

作者：黄春燕北京物资学院外语系北京101149

The thesis summarizes bell hooks' stand and viewpoints as expressed in her book Outlaw Culture:resisting *** this collection,hooks argues that the outlaw culture,a culture of the marginalized groups including black people and women,is either distorted or misinterpreted by the mainstream culture which is a white supremacist patriarchal ***,she calls for a resistance against the mainstream culture's misrepresentations of the outlaw culture.

关键词： bell hooks outlaw culture resist representations t

resistANCE OF THE DEUTERATED YEAST TO THE RADIATION OF FAST NEUTRONS

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Chinese Science Bulletin 1984年第2期29卷 253-255页

作者：要福增吴元芳张留芳李惠源周迪时舒荣生 Shanghai Institute of Nuclear Research Academia Sinica Shanghai Beer plant Shanghai Institute of Materia Medies Academia Sinica

The relative biological effect of the fast neutron is far greater than 1, thus a neutron bomb can kill the living beings through its strong neutron radiation. Theoretically, if the protium composition is substituted by deuterium, an organism could resist neutron radiationt. In this experiment, a brewe’s yeast (Saccharomyces carls-

关键词： neutron Saccharomyces resist yeast substituted ordinary 凌山 FAST 子工 radia

Some Observations on the Position and Role of The Chinese People's War of resistance against Japanese Aggression in World War Ⅱ

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Peace 2015年第3期 15-19页

作者： Hu Dekun The Chinese Research Association of History of the Second World War

*** is the first country to resist the fascist aggression in the world,and opens up the world’s first anti-fascist *** fascist forces waged World WarⅡ.Those fascists exercised cruel and autocratic rule internally,and carried out unbridled aggression and expansion targeted at countries of various social *** the 1920s-1930s,the fascist forces in Italy,Japan and Germany consecutively came to power,and were

关键词： Japanese resist targeted Burma armed German issued

Association of adiponectin,free fatty acids,and insulin resistance with metabolic syndrome and its components in Uygur Xinjiang

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China Medical Abstracts(Internal Medicine) 2014年第2期31卷 88-89页

作者：闫贻忠 Dept Public Health Med CollShihezi Univ

Objective To investigate the association of adiponectin(APN),free fatty acids(FFA),and insulin resistance(IR)with metabolic syndrome(MS)and its *** In the baseline survey,the subjects were divided into MS group and th... 详细信息

关键词： baseline resist fasting compo incidence finding opposite raised Serum

A process study of electron beam nano-lithography and deep etching with an ICP system

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Science China(Technological Sciences) 2009年第6期52卷 1665-1671页

作者： LI QunQing ZHANG LiHui CHEN Mo FAN ShouShan Department of Physics and Tsinghua-Foxconn Nanotechnology Research Center Tsinghua UniversityBeijing 100084China

A systemic process study on an electron beam nanolithography system operating at 100kV was *** exposure conditions were optimized for resist *** structures with line/space of 50nm/50nm were obtained in a reasonably thick resist which is beneficial to the subsequent pattern transfer *** ICP etching process conditions was *** role of etching parameters such as source power,gas pressure,and gas flow rate on the etching result was also discussed.A grating structure with line widths as small as 100nm,duty cycles of 0.5,depth of 900nm,and the side-wall scalloping as small as 5nm on a silicon substrate was *** silicon deep etching technique for structure sizes smaller than 100nm is very important for the fabrication of nano-optical devices working in the visible regime.

关键词： electron beam lithography ZEP520A resist reactive ion etching nanofabrication

Shrinkage Properties of Wool and Acrylic/Wool Plain Knitted Fabrics Treated with DC109

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Journal of China Textile University(English Edition) 1999年第2期16卷 61-67页

作者： Au K.F Ng K.Y The Hong Kong Polytechnic Univ Hong Kong Hong Kong

This paper examines the effects of shrink - resist treatment, washing cycle and fabric tightness on the shrinkage properties of plain knitted fabrics made from 100% wool, acrylic/wool (50/50) and acrylic/wool (70/30). It was found that shrinkages of both treated and untreated wool fabrics were negatively correlated to fabric tightness and exceeded the IWS shrinkage limits (5% in length and 8 % in area) after 2 - 5A washing cycle. The effect of tightness was not as obvious with acrylic/wool (A/W) fabrics, but the shrinkage was seen to increase with stages of washing cycle for untreated A/W fabrics with some exceeding IWS standard. By applying the DC 109 shrink - resist solvent treatment, it was identified that by with higher percentage of acrylic fibre blended with wool, shrinkage could be reduced considerably and within acceptable limits.

关键词： wool acrylic/wool shrink - resist treatment tightness factor washing cycle .

Quick screening and easy detection method of NDM-gene in clinical isolates:A need of the time

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Asian Pacific Journal of Tropical Medicine 2012年第10期5卷 839-840页

作者： Asad U Khan Saeedut Z Ali Interdisciplinary Biotechnology Unit Aligarh Muslim University

The emerging trend of multidrug resistance is becoming a major threat to community acquired and nosocomial infections,worldwide[1].The carbapenems are used as last-source drugs because of increasing resistance against... 详细信息

关键词： screening lactam nosocomial antibiotics isolates threat becoming emerging resist DNA