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Modulation of the plasma uniformity by coil and dielectric window structures in an inductively coupled plasma

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plasma Science and Technology 2021年第9期23卷 111-122页

作者： Xiaoyan SUN Yuru ZHANG Jing YE Younian WANG Jianxin HE Textile and Garment Industry of Research In stitute Zhongyuan University of Tech no logyZhengzhou 450007.People's Republic of China Key Laboratory of Materials Modification by Laser Ion and Electron Beams(Ministry of Education)School of PhysicsDalian University of TechnologyDalian 116024People's Republic of China School of Textiles Zhongyuan University of Technology.Zhengzhou 450007People's Republic of China

The effects of coil and dielectric window structures on the plasma distribution are examined in a cylindrically symmetric planar inductively coupled plasma(ICP).A two-dimensional(2 D)fluid model is employed to investigate the design issues of ICP source for *** the gradient coil structure is applied at 400 W and 20 mTorr,the ionization rate caused by the power deposition decreases at the reactor center as compared to that in a reactor with a planar coil above the planar dielectric window,and a rather uniform plasma is ***,for the vertical coil geometry,all the coils move to the position of the outermost coil,and the peaks of the power deposition and ionization rate appear at the radial edge of the *** this case,the plasma density is characterized by an edge-high ***,it is observed that the plasma uniformity is improved by increasing the source power under a gas pressure of 20 mTorr and becomes better when the gas pressure increases to 30 mTorr with the source power being fixed at400 W in the gradient coil configuration,but the uniformity of plasma worsens with the rising source power or pressure due to the strong localization in the vertical coil ***,when the discharge is sustained in a reactor with a stepped dielectric window at r=0.135 m,the best plasma uniformity is obtained at 400 W and 20 m Torr because the ionization rate is enhanced at the outermost coil,and the dielectric window at r=0.135 m blocks the diffusion of plasma towards the *** addition,higher source power and lower gas pressure produce more uniform plasma for the designs with a stepped window near the symmetry *** the dielectric window is stepped at r=0.135 m,the non-uniformity of plasma initially decreases and then increases with the increase in source power or gas *** the dielectric window is stepped at the radial edge of the chamber,the plasma uniformity is improved by increasing the source power and gas pressure due t

关键词： fluid simulation gradient coil vertical coil stepped dielectric window plasma uniformity

Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma

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plasma Science and Technology 2024年第6期26卷 79-87页

作者：王森张权治马方方 Maksudbek YUSUPOV 王友年 School of Physics Dalian University of TechnologyDalian 116024People’s Republic of China Laboratory of Thermal Physics of Multiphase Systems Arifov Institute of Ion-Plasma and Laser TechnologiesAcademy of Sciences of UzbekistanTashkent 100125Uzbekistan Department of Power Supply and Renewable Energy Sources National Research University TIIAMETashkent 100000Uzbekistan

A two-dimensional fluid model based on COMSOL Multiphysics is developed to investigate the modulation of static magnetic field on plasma homogeneity in a capacitively coupled plasma(CCP)chamber. To generate a static magnetic field, direct current is applied to a circular coil located at the top of the chamber. By adjusting the magnetic field's configuration, which is done by altering the coil current and position, both the plasma uniformity and density can be significantly modulated. In the absence of the magnetic field, the plasma density exhibits an inhomogeneous distribution characterized by higher values at the plasma edge and lower values at the center. The introduction of a magnetic field generated by coils results in a significant increase in electron density near the coils. Furthermore, an increase in the sets of coils improves the uniformity of the plasma. By flexibly adjusting the positions of the coils and the applied current,a substantial enhancement in overall uniformity can be achieved. These findings demonstrate the feasibility of using this method for achieving uniform plasma densities in industrial applications.

关键词： COMSOL capacitively coupled plasma plasma uniformity magnetic field

Effects of external parameters on plasma characteristics and uniformity in a dual cylindrical inductively coupled plasma

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plasma Science and Technology 2024年第12期26卷 63-74页

作者： Pengyu WANG Siyu XING Daoman HAN Yuru ZHANG Yong LI Cheng ZHOU Fei GAO Younian WANG Key Laboratory of Materials Modification by Laser Ionand Electron Beams(Ministry of Education)School of PhysicsDalian University of TechnologyDalian 116024People’s Republic of China Lab of Advanced Space Propulsion and Beijing Engineering Research Center of Efficient and Green Aerospace Propulsion Technology Beijing Institute of Control EngineeringBeijing 100190People’s Republic of China

The dual cylindrical inductively coupled plasma source,compared to the conventional structure of inductively coupled plasma source,can significantly improve the uniformity of *** has an enhanced potential for application in processes,such as etching and ashing.A uniform plasma can be obtained by allowing the remote plasma from the upper chamber modulate the main plasma generated in the lower *** this study,a fluid model was employed to investigate a dual cylindrical inductively coupled Ar/O_(2)*** effects of external parameters on electron density,electron temperature,O atomic density,and plasma uniformity in the main chamber were studied,and the reasons were *** results of this study show that remote power can control the plasma uniformity and increase the plasma density in the main *** the remote power increased,plasma uniformity improved initially and then *** main power affected the plasma density at the edge of the main chamber and can modulate the plasma density in the main *** gas pressure affected both the uniformity and density of the *** the gas pressure increased,the plasma uniformity deteriorated,but the free radical density improved.

关键词： dual inductively coupled plasma remote plasma plasma uniformity fluid model

Effect of coil and chamber structure on plasma radial uniformity in radio frequency inductively coupled plasma

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plasma Science and Technology 2024年第7期26卷 58-66页

作者：赵洋周晓华高升荣宋莎莎赵玉真 Shaanxi International Joint Research Center for Applied Technology of Controllable Neutron Source Xijing UniversityXi’an 710123People’s Republic of China Technological Institute of Materials&Energy Science(TIMES) Xi’an Key Laboratory of Advanced Photo-electronics Materials and Energy Conversion DeviceSchool of Electronic InformationXijing UniversityXi’an 710123People’s Republic of China

Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma(ICP)to meet the demand for large-area and uniformly distributed plasma in industrial *** study utilized a two-dimensional self-consistent fluid model to investigate how different coil configurations and chamber aspect ratios affect the radial uniformity of plasma in radio frequency *** findings indicate that optimizing the radial spacing of the coil enhances plasma uniformity but with a reduction in electron ***,optimizing the coil within the ICP reactor,using the interior point method in the Interior Point Optimizer significantly enhances plasma uniformity,elevating it from 56%to 96%within the range of the model ***,when the chamber aspect ratio k changes from 2.8 to 4.7,the plasma distribution changes from a center-high to a saddleshaped ***,the plasma uniformity becomes ***,adjusting process parameters,such as increasing source power and gas pressure,can enhance plasma *** findings contribute to optimizing the etching process by improving plasma radial uniformity.

关键词： inductively coupled plasma fluid simulation optimized coil chamber aspect ratio plasma uniformity

Simulations of standing wave effect,stop band effect,and skin effect in large-area very high frequency symmetric capacitive discharges

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plasma Science and Technology 2021年第3期23卷 82-92页

作者： Jiankai LIU Yuru ZHANG Kai ZHAO Deqi WEN Younian WANG Key Laboratory of Materials Modification by Laser lonand Electron Beams(Ministry of Education)School of PhysicsDalian University of TechnologyDalian 116024People's Republic of China Department of Elctrical and Computer Engineering Michigan State UniversityEast LansingMI 48824United States of America

In this paper,Maxwell equations are coupled with a radially localized global model and an analytical sheath model to investigate the electromagnetic effects under various frequencies and electron powers in large-area very high frequency symmetric capacitive argon *** results indicate that both the vacuum wavelength and the sheath width decrease with frequency,leading to the reduced surface *** a result,the standing wave effect becomes pronounced,causing the fact that the radial profiles of the electron density,radio frequency voltage,and sheath width shift from uniform over center-high to *** the frequency is close to or higher than the series resonance frequency,the surface waves cannot propagate to the radial center because of the significant radial *** to the lack of power deposition near the radial center,the electron density is nearly zero there,*** stop band *** power increases,the higher electron density leads to the decrease of the skin ***,the importance of the skin effect gradually exceeds that of the standing wave effect,giving rise to the transition from the center-high to edge-high electron density *** method proposed in this work could help to predict the plasma distribution under different discharge conditions in a few minutes,which is of significant importance in optimizing the plasma processing.

关键词： electromagnetic effects hybrid model plasma uniformity