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Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems

Chinese Optics Letters 2018年第3期16卷 71-75页

作者： Zelong Zhou Hongbo Shang Yongxin Sui Huaijiang Yang Engineering Researcher Center of Extreme Precision Optics Changchun Institute of OpticsFine Mechanics and PhysicsChinese Academy of SciencesChangchun 130033China University of Chinese Academy of Sciences Beijing 100049China

Calcium fluoride is widely used in optical lithography lenses and causes retardation that cannot be ***,few studies have been conducted to compensate for the retardation caused by calcium fluoride in optical lithography *** this Letter,a new index based on orientation Zernike polynomials is established to describe the value of ***,a method of retardation compensation is *** method is implemented by clocking calcium fluoride lens elements,and the optimal rotation angles are calculated using a population-based stochastic optimization ***,an example is provided to validate the method.

关键词： Deep ultraviolet Fluoride optical elements optical lithography Phase shift Zernike polynomials

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Design and tailoring of patterned ZnO nanostructures for energy conversion applications

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Science China Materials 2017年第9期60卷 793-810页

作者：司浩楠康卓廖庆亮张铮张晓梅汪莉张跃 State Key Laboratory for Advanced Metals and Materials School of Materials Science and EngineeringUniversity of Science and TechnologyBeijingBeijing 100083China Department of Mechanical Engineering Tokyo Institute of TechnologyTokyoJapan Civil and Environment Engineering School University of Science and Technology BeijingBeijing 100083China Beijing Municipal Key Laboratory of New Energy Materials and Technologies University of Science and Technology BeijingBeijing 100083China

ZnO is a typical direct wide-bandgap semiconductor material, which has various morphologies and unique physical and chemical properties, and is widely used in the fields of energy, information technology, biomedicine, and others. The precise design and controllable fabrication of nanostructures have gradually become important avenues to further enhancing the performance of Zn O-based functional nanodevices. This paper introduces the continuous development of patterning technologies, provides a comprehensive review of the optical lithography and laser interference lithography techniques for the controllable fabrication of Zn O nanostructures, and elaborates on the potential applications of such patterned Zn O nanostructures in solar energy, water splitting, light emission devices, and nanogenerators. Patterned Zn O nanostructures with highly controllable morphology and structure possess discrete three-dimensional space structure, enlarged surface area, and improved light capture ability, which realize the efficient carrier regulation,achieve highly efficient energy conversion, and meet the diverse requirements of functional nanodevices. The patterning techniques proposed for the precise design of Zn O nanostructures not only have important guiding significance for the controllable fabrication of complex nanostructures of other materials, but also open up a new route for the further development of functional nanostructures.

关键词： patterned ZnO nanorod arrays laser interference lithography optical lithography energy conversion devices

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Important Works About Rules in Rules-Based optical Proximity Correction

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Journal of Semiconductors 2002年第7期23卷 701-706页

作者：石蕊蔡懿慈洪先龙吴为民杨长旗清华大学计算机科学与技术系北京100084

Considering the efficiency and veracity of rules based optical proximity correction (OPC),the importance of rules in rules based OPC is pointed *** how to select,to construct and to apply more concise and practical rules base is *** on those ideas,four primary rules are *** data resulted in rules base are shown in *** patterns on wafer are clearly improved by applying these rules to correct ***,the automatic construction of the rules base is an important part of the whole rules based OPC system.

关键词： optical lithography optical proximity correction rules base

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Electron beam direct writing technology and application in the research of high frequency SAW devices

Electron beam direct writing technology and application in t...

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2011年全国压电和声波理论及器件应用研讨会

作者： Zi-kun FAN~(1,*),Xiao-yang CHEN~1,Xu-ming BIAN~1 1 Beijing Changfeng SAW company,Beijing 100854

＜正＞Communication technologies develop very fast in recent years,especially mobile communication *** of the key parts of communication system is the SAW device,which development directions are high frequency,low ins... 详细信息

关键词： Electron beam Exposure optical lithography

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Method for measuring the granite surface topography of wafer stage with laser interferometer

Method for measuring the granite surface topography of wafer...

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2nd International Symposium on Advanced optical Manufacturing and Testing Technologies

作者： Le He, Xiangzhao Wang, Weijie Shi, Jianming Hu Information Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China Graduate School of the Chinese Academy of Sciences, Beijing 100039, China

＜正＞Topography of a granite surface has an effect on the vertical positioning of a wafer table in a lithographic tool, when the wafer table moves on the granite. The inaccurate measurement of the topography results in a bad leveling and focusing performance. In this paper, a method to measure the topography of a granite surface with high accuracy is presented. In this method, a double frequency laser interferometer is used to measure the tilts of the wafer table in the X and Y direction. From the tilts information, the height of every point on the surface can be obtained by a special algorithm. Then, according to the height information, a high order polynomial is fitted to express the topography of the granite surface with high accuracy. Experiment results shows that the measurement reproducibility of the method is better than 10 nm.

关键词： laser interferometer topography measurement least squares method scanning wafer stage optical lithography

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