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A Derivative of s-Triazine Modified Reduced Graphene Oxide with the Function of UV-absorbing

Chinese Journal of Chemistry 2016年第1期34卷 123-128页

作者： Tianye Liu Hongxia Yan Zhengyan Chen Peilun Xu Shikun Su Department of Applied Chemistry School of Science Northwestern Polytechnical University Xi'an Shaanxi 710129 China

A new s-triazine derivative modified graphene composite, in which 2,4,6-tri（2,4-dihydroxyphenyl）-1,3,5- triazine （TDTA） was attached onto reduced graphene oxide （rGO） via the noncovalent functionalization approach, named TDTA/rGO, was reported. And the TDTA was synthesized via a Friedel-Crafts reaction. FTIR and NMR spectroscopic characterizations were carried out to confirm the synthesis of TDTA. UV-Vis, XPS and TEM revealed that TDTA molecules were successfully loaded onto graphene sheets by π-π stacking, and the composite is found to improve greatly the dispersity ofrGO in DMF and to be a good UV-absorber.

关键词： graphene 2,4,6-tri(2,4-dihydroxyphenyl)-1,3,5-triazine UV-absorber noncovalent functionalization

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Patterning Functionalized Surfaces of 2D Materials by Nanoshaving

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Nanomanufacturing and Metrology 2022年第1期5卷 23-31页

作者： Katie O'Neill Rob Greig Rita Tilmann Lisanne Peters Conor P.Cullen Graeme Cunningham Cian Bartlam Cormac O Coileain Niall McEvoy Georg S.Duesberg School of Physics Trinity College DublinDublin 2 D02 PN40Ireland AMBER Centre CRANN InstituteTrinity College DublinDublin 2Ireland Institute of Physics EIT 2Faculty of Electrical Engineering and Information TechnologyUniversitat der Bundeswehr Miinchen85579 NeubibergGermany School of Chemistry Trinity College DublinDublin 2Ireland

Atomic force microscopy(AFM)and scanning probe lithography can be used for the mechanical treatment of various surfaces,including polymers,metals,and *** technique of nanoshaving,in which materials are removed using the AFM tip,is employed in this work to produce nanopatterns of self-assembled monolayers(SAMs)on two-dimensional(2D)*** materials used are monolayers of transition metal dichalcogenides(TMDs),namely,MoS_(2)and WS_(2),which are noncovalently functionalized with perylene diimide(PDI),a perylene *** approach involves rastering an AFM probe across the surface at a controlled increased load in ambient *** a result of the strong bond between PDI SAM and TMD,loads in excess of 1|1N are required to pattern the *** predefined patterns,including a grating pattern with feature sizes below 250 nm,are *** indicate the high precision of nanoshaving as an accurate and nondestructive lithographic technique for 2D *** work functions of shaved heterostructures are also examined using Kelvin probe force microscopy.

关键词： Nanoshaving AFM KPFM Perylene diimide 2D materials MoS_(2) WS_(2) noncovalent functionalization

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