检索结果-南通市图书馆

Soft thermal nanoimprint lithography using a nanocomposite mold

在线全文

学校读者我要写书评

暂无评论

Nano Research 2018年第5期11卷 2705-2714页

作者： Viraj Bhingardive Liran Menahem Mark Schvartzman Department of Materials Engineering Isle Katz Institute of Nanoscale Science and Technology Ben-Gurion University of the Negev P.O. Box 653 Beer-Sheva 8410501 Israel

Soft nanoimprint lithography has been limited to ultraviolet （UV） curable resists. Here, we introduce a novel approach for soft thermal nanoimprinting. This unprecedented combination of the terms ＂soft＂ and ＂thermal＂ for nanoimprinting became possible thanks to an innovative nanocomposite mold consisting of a flexible polydimethylsiloxane （PDMS） substrate with chemically attached rigid relief features. We used soft thermal nanoimprinting to produce high-resolution nanopatterns with a sub-100 nm feature size. Furthermore, we demonstrate the applicability of our nanoimprint approach for the nanofabrication of thermally imprinted nanopattems on non-planar surfaces such as lenses. Our new nanofabrication strategy paves the way to numerous applications that require the direct fabrication of functional nanostructures on unconventional substrates.

关键词： soft lithography nanoimprint lithography polydimethylsiloxane(PDMS) non-planar substrates

Discretely-supported nanoimprint lithography for patterning the high-spatial-frequency stepped surface

在线全文

维普期刊数据库

学校读者我要写书评

暂无评论

Nano Research 2021年第8期14卷 2606-2612页

作者： Chunhui Wang Yu Fan Jinyou Shao Zhengjie Yang Jiaxing Sun Hongmiao Tian Xiangming Li Micro-and Nano-technology Research Center State Key Laboratory for Manufacturing Systems Engineering Xi’an Jiaotong UniversityXi’an 710049China

Non-planar morphology is a common feature of devices applied in various physical fields,such as light or fluid,which pose a great challenge for surface nano-patterning to improve their *** present study proposes a discretely-supported ***(NIL)technique to fabricate nanostructures on the extremely non-planar surface,namely high-spatial-frequency stepped *** designed discretely imprinting template implanted a discretely-supported intermediate buffer layer made of sparse pillars *** allowed the simultaneous generation of air-cushion-like buffer and reliable support to the thin structured layer in the *** resulting low bending stiffness and distributed concentrated load of the template jointly overcome the contact difficulty with a stepped surface,and enable the template to encase the stepped protrusion as tight as *** on the proposed discretely-supported NIL,nanostructures were fabricated on the luminous interface of light emitting diodes chips that covered with micrometer step electrodes *** 96%of the utilized indium tin oxide transparent current spreading layer surface on top of the light emitting diode(LED)chips was coated with nanoholes array,with an increase by more than 40%in the optical output *** excellent ability of nanopatterning a non-planar substrate could potentially lead innovate design and development of high performance device based on discretely-supported NIL.

关键词： nanoimprint lithography non-planar surface discretely-supported template nanopatterning semiconductor light emitting devices

Spatially-separated and photo-enhanced semiconductor corrosion processes for high-efficient and contamination-free electrochemical nanoimprint lithography

在线全文

维普期刊数据库

学校读者我要写书评

暂无评论

Science China Chemistry 2022年第4期65卷 810-820页

作者： Hantao Xu Lianhuan Han Jian-Jia Su Zhong-Qun Tian Dongping Zhan Key Laboratory of Physical Chemistry of Solid Surfaces(PCOSS) Engineering Research Center of Electrochemical Technologies of Ministry of EducationDepartment of ChemistryCollege of Chemistry and Chemical EngineeringXiamen UniversityXiamen 361005China Department of Mechanical and Electrical Engineering School of Aerospace EngineeringXiamen UniversityXiamen 361005China

Free of any thermoplastic or photocuring resists, electrochemical nanoimprint lithography(ECNL) has emerged as an alternative nanoimprint way to fabricate three-dimensional micro/nano-structures(3D-MNSs) directly on a semiconductor wafer by a spatially-confined corrosion reaction induced by the metal/semiconductor contact potential. However, the consumption of electron acceptors in the ultrathin electrolyte between imprint mold and semiconductor wafer will slow down or even cease the corrosion rate. To solve this problem, we change the short-circuited corrosion cell into a spatially-separated primary cell: the imprint mold compacted gallium arsenide(GaAs) wafer in the anodic chamber while the platinum(Pt) plate connected to the imprint mold in the cathodic chamber. Thus, the GaAs corrosion rate will be stabilized in its limiting steady-state current density because of the abundant source of electron acceptors in the catholic chamber. The corrosion processes can be photo-enhanced by white-light illumination. Consequently, both the accuracy and the efficiency are promoted dramatically, which are demonstrated by the excellent performance of the fabricated binary optical elements. Moreover, the contamination problem caused by the electron acceptors is totally avoided. All the results prove that this novel ECNL mode is competitive and prospective in imprinting 3D-MNSs directly on semiconductor wafer.

关键词： nanoimprint lithography electrochemical microfabrication semiconductor corrosion semiconductor microdevices 3D functional micro/nano-structures

Strategies to obtain pattern fidelity in nanowire growth from large-area surfaces patterned using nanoimprint lithography

在线全文

学校读者我要写书评

暂无评论

Nano Research 2016年第10期9卷 2852-2861页

作者： Gaute Otnes Magnus Heurlin Mariusz Graczyk Jesper Wallentin Daniel Jacobsson Alexander Berg Ivan Maximov Magnus T. Borgstrom Solid State Physics Lund University Box 118 S-22100 Lund Sweden

Position controlled nanowire growth is important for nanowire-based optoelectronic components which rely on light emission or light absorption. For solar energy harvesting applications, dense arrays of nanowires are needed; however, a major obstacle to obtaining dense nanowire arrays is seed particle displacement and coalescing during the annealing stage prior to nanowire growth. Here, we explore three different strategies to improve pattern preservation of large-area catalyst particle arrays defined by nanoimprint lithography for nanowire growth. First, we see that heat treating the growth substrate prior to nanoimprint lithography improves pattern preservation. Second, we explore the possibility of improving pattern preservation by fixing the seed particles in place prior to annealing by modifying the growth procedure. And third, we show that a SiNx growth mask can fully prevent seed particle displacement. We show how these strategies allow us to greatly improve the pattern fidelity of grown InP nanowire arrays with dimensions suitable for solar cell applications, ultimately achieving 100% pattern preservation over the sampled area. The generic nature of these strategies is supported through the synthesis of GaAs and GaP nanowires.

关键词： semiconductor nanowire nanoimprint lithography metal-organic vaporphase epitaxial (MOVPE) patterning

Four-Channel 1.55μm DFB Laser Array Monolithically Integrated with a 4× 1 Multimode-Interference Combiner Based on nanoimprint lithography

在线全文

维普期刊数据库

学校读者我要写书评

暂无评论

Chinese Physics Letters 2014年第4期31卷 72-75页

作者： CHEN Xin ZHAO Jian-Yi ZHOU Ning HUANG Xiao-Dong LIU Wen Wuhan National Laboratory for Optoelectronics School of Optical and Electronic information Huazhong University of Science and Technology Wuhan 430074 Accelink Technologies Company Ltd Wuhan 430074 Institute of Advanced Technology University of Science and Technology of China Hefei 230026

A monolithically integrated four-channel λ/4 phase shift distributed feedback （DFB） laser array with a 4 × 1 multimode interference combiner is designed and fabricated using nanoimprint lithography. The threshold currents of the lasers are less than 10mA, which are as good as a discrete DFB laser. Moreover, the side-mode suppression ratio is also better than 50 dB. The channel space is about 200 GHz for dense wavelength division multiplexing applications in an 1.55μm system.

关键词： PHASE shift (Nuclear physics) DISTRIBUTED feedback lasers nanoimprint lithography WAVELENGTH division multiplexing MULTIMODE waveguides

Key process study in nanoimprint lithography

在线全文

维普期刊数据库

学校读者我要写书评

暂无评论

Journal of Semiconductors 2012年第10期33卷 138-141页

作者：王智浩刘文王磊左强赵彦立 Wuhan National Laboratory for Optoelectronics School of Optoelectronic Science and EngineeringHuazhong University of Science and Technology

nanoimprint lithography（NIL） is widely used in the fabrication of nano-scale semiconductor devices for its advantages of high resolution,low cost,and high ***,traditional hard stamp imprinting has some drawbacks such as short stamp lifetime,bad uniformity in big areas,and large particle *** this paper, a flexible intermediate polymer stamp（IPS） is proposed to solve the drawbacks mentioned ***, we use a method of temperature-pressure variation imprinting to improve the resist liquidity in the process of imprinting,and eventually we achieve high quality *** method combined with IPS has been used to fabricate a high quality grating whose half pitch is 50 nm.

关键词： nanoimprint lithography soft mold temperature-pressure variation

High-refractive index acrylate polymers for applications in nanoimprint lithography

在线全文

学校读者我要写书评

暂无评论

Chinese Chemical Letters 2020年第1期31卷 256-260页

作者： Yunhui Tang Stefano Cabrini Jun Nie Carlos Pina-Hernandez State Key Laboratory of Chemical Resource Engineering Beijing University of Chemical TechnologyBeijing 100029China The Molecular Foundry LBNLBerkeleyCA 94702United States aBeam Technologies Castro ValleyCA 94546United States

The development of polymeric optical materials with a higher refractive index,transparency in the visible spectrum region and easier processability is increasingly desirable for advanced optical applications such as microlenses,image sensors,and organic light-emitting *** acrylates have a low refractive index(around 1.50)which does not meet the high perfo rmance requirements of advanced optical *** this research,three novel acrylates were synthesized via a facile one-step approach and used to fabricate optical transparent *** of the polymers reveal good optical properties including high transparency(≥90%)in the visible spectrum region and high refractive index values(1.6363)at 550 ***,nanostructures of these acrylate polymers with various feature sizes including nanogratings and photonic crystals were successfully fabricated using nanoimprint *** results indicate that these acrylates can be used in a wide range of optical and optoelectronic devices where nanopatterned films with high refractive index and transparency are required.

关键词： High refractive index Acrylate Facile synthesis Nanostructure nanoimprint lithography

Development and Implementation of a Rotating nanoimprint lithography Tool for Orthogonal Imprinting on Edges of Curved Surfaces

在线全文

学校读者我要写书评

暂无评论

Nanomanufacturing and Metrology 2021年第3期4卷 175-180页

作者： Shraddha Supreeti Ralf Schienbein Patrick FeBer Florian Fern Martin Hoffmann Stefan Sinzinger Electronics Technology Group Technical University of IlmenauIlmenauGermany Institute for Design and Precision Engineering Technical University of IlmenauIlmenauGermany Technical Optics Group Technical University of IlmenauIlmenauGermany JUMO GmbH&Co.KG FuldaGermany Microsystems Technology Group Ruhr-University BochumBochum.Germany

Uniform molding and demolding of structures on highly curved surfaces through conformal contact is a crucial yet often-overlooked aspect of nanoimprint lithography(NIL).This study describes the development of a NIL tool and its integration into a nanopositioning and nanomeasuring machine to achieve high-precision orthogonal molding and demolding for soft ultraviolet-assisted NIL(soft UV-NIL).The process was implemented primarily on the edges of highly curved plano-convex substrates to demonstrate structure uniformity on the ***-resolution nanostructures of sub-200-nm lateral dimension and microstructures in the range of tens of microns were ***,the nanostructures on the edges of the large,curved substrates were difficult to characterize ***,microstructures were used to measure the structure fidelity and were characterized using profilometry,white light interferometry,and confocal laser scanning *** of the restricted imaging capabilities at high inclinations for high-resolution nanostructures,the scanning electron microscope(SEM)imaging of the structures on top of the lens substrate and at an inclination of 45°was *** micro and nanostructures were successfully imprinted on the edges of the plano-convex lens at angles of 45°,60°,and 90°from the center of rotation of the rotating NIL *** method enables precise imprinting at high inclinations,thereby presenting a different approach to soft UV-NIL on curved surfaces.

关键词： nanoimprint lithography Rotating NIL tool Curved surface Imprinting Nanopositioning

Design of multi-functional dual hole patterned carbon nanotube composites with superhydrophobicity and durability

在线全文

维普期刊数据库

学校读者我要写书评

暂无评论

Nano Research 2013年第6期6卷 389-398页

作者： Sung-Hoon Park Eun-Hyoung Cho Jinseung Sohn Paul Theilmann Kunmo Chu Sunghee Lee Yoonchul Sohn Dongouk Kim Byunghoon Kim Samsung Advanced Institute of Technology Yong-in 446-712 R. O. Korea Department of Electrical Engineering University of California San Diego La Jolla California 92093 USA

Most current research on nanocomposites has focused on their bulk attributes, i.e., electrical, microwave, thermal, and mechanical properties. In practical applications, surface properties such as robustness against environmental contamination are critical design considerations if intrinsic properties are to be maintained. The aim of this research is to combine the bulk properties of nanocomposites with the superhydrophobic surface properties provided by imprinting techniques to create a single multi-functional system with enhanced bulk properties. We report the development of a highly conductive superhydrophobic nanotube composite, which is directly superimposed with a durable dual hole pattern through imprinting techniques. The dual hole pattern avoids the use of high slenderness ratio structures resulting in a surface which is robust against physical damage. Its stable superhydrophobic properties were characterized both theoretically and experimentally. By incorporating high aspect ratio carbon nanotubes （CNTs）, the dual patterned composites can also be effectively used for anti-icing and deicing applications where their superhydrophobic surface suppresses ice formation and their quick electric heating response at low voltage eliminates remaining frost. In addition, superior electromagnetic interference （EMI） shielding effectiveness （SE） was attained, with one of the highest values ever reported in the literature.

关键词： dual hole nanoimprint lithography superhydrophobic arbon nanotube durability multifunction