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Spatially-separated and photo-enhanced semiconductor corrosion processes for high-efficient and contamination-free electrochemical nanoimprint lithography

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Science China Chemistry 2022年第4期65卷 810-820页

作者： Hantao Xu Lianhuan Han Jian-Jia Su Zhong-Qun Tian Dongping Zhan Key Laboratory of Physical Chemistry of Solid Surfaces(PCOSS) Engineering Research Center of Electrochemical Technologies of Ministry of EducationDepartment of ChemistryCollege of Chemistry and Chemical EngineeringXiamen UniversityXiamen 361005China Department of Mechanical and Electrical Engineering School of Aerospace EngineeringXiamen UniversityXiamen 361005China

Free of any thermoplastic or photocuring resists, electrochemical nanoimprint lithography(ECNL) has emerged as an alternative nanoimprint way to fabricate three-dimensional micro/nano-structures(3D-MNSs) directly on a semiconductor wafer by a spatially-confined corrosion reaction induced by the metal/semiconductor contact potential. However, the consumption of electron acceptors in the ultrathin electrolyte between imprint mold and semiconductor wafer will slow down or even cease the corrosion rate. To solve this problem, we change the short-circuited corrosion cell into a spatially-separated primary cell: the imprint mold compacted gallium arsenide(GaAs) wafer in the anodic chamber while the platinum(Pt) plate connected to the imprint mold in the cathodic chamber. Thus, the GaAs corrosion rate will be stabilized in its limiting steady-state current density because of the abundant source of electron acceptors in the catholic chamber. The corrosion processes can be photo-enhanced by white-light illumination. Consequently, both the accuracy and the efficiency are promoted dramatically, which are demonstrated by the excellent performance of the fabricated binary optical elements. Moreover, the contamination problem caused by the electron acceptors is totally avoided. All the results prove that this novel ECNL mode is competitive and prospective in imprinting 3D-MNSs directly on semiconductor wafer.

关键词： nanoimprint lithography electrochemical microfabrication semiconductor corrosion semiconductor microdevices 3D functional micro/nano-structures

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nanoimprint lithography:A Processing Technique for Nanofabrication Advancement

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Nano-Micro Letters 2011年第2期3卷 135-140页

作者： Weimin Zhou Guoquan Min Jing Zhang Yanbo Liu Jinhe Wang Yanping Zhang Feng Sun Laboratory of Nanotechnology Shanghai Nanotechnology Promotion Center (SNPC)

nanoimprint lithography(NIL) is an emerging micro/nano-patterning technique,which is a high-resolution,high-throughput and yet simple fabrication process.According to International Technology Roadmap for Semiconductor(ITRS),NIL has emerged as the next generation lithography candidate for the22 nm and 16 nm technological nodes.In this paper,we present an overview of nanoimprint lithography.The classfication,research focus,critical issues,and the future of nanoimprint lithography are intensively elaborated.A pattern as small as 2.4 nm has been demonstrated.Full-wafer nanoimprint lithography has been completed on a 12-inch wafer.Recently,12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group,a leading nanoimprint lithography technology supplier.

关键词： nanoimprint lithography Soft molecular scale Nanofabrication

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Discretely-supported nanoimprint lithography for patterning the high-spatial-frequency stepped surface

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Nano Research 2021年第8期14卷 2606-2612页

作者： Chunhui Wang Yu Fan Jinyou Shao Zhengjie Yang Jiaxing Sun Hongmiao Tian Xiangming Li Micro-and Nano-technology Research Center State Key Laboratory for Manufacturing Systems Engineering Xi’an Jiaotong UniversityXi’an 710049China

Non-planar morphology is a common feature of devices applied in various physical fields,such as light or fluid,which pose a great challenge for surface nano-patterning to improve their performance.The present study proposes a discretely-supported nanoimprint.lithography(NIL)technique to fabricate nanostructures on the extremely non-planar surface,namely high-spatial-frequency stepped surface.The designed discretely imprinting template implanted a discretely-supported intermediate buffer layer made of sparse pillars arrays.This allowed the simultaneous generation of air-cushion-like buffer and reliable support to the thin structured layer in the template.The resulting low bending stiffness and distributed concentrated load of the template jointly overcome the contact difficulty with a stepped surface,and enable the template to encase the stepped protrusion as tight as possible.Based on the proposed discretely-supported NIL,nanostructures were fabricated on the luminous interface of light emitting diodes chips that covered with micrometer step electrodes pad.About 96%of the utilized indium tin oxide transparent current spreading layer surface on top of the light emitting diode(LED)chips was coated with nanoholes array,with an increase by more than 40%in the optical output power.The excellent ability of nanopatterning a non-planar substrate could potentially lead innovate design and development of high performance device based on discretely-supported NIL.

关键词： nanoimprint lithography non-planar surface discretely-supported template nanopatterning semiconductor light emitting devices

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Key process study in nanoimprint lithography

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Journal of Semiconductors 2012年第10期33卷 138-141页

作者：王智浩刘文王磊左强赵彦立 Wuhan National Laboratory for Optoelectronics School of Optoelectronic Science and EngineeringHuazhong University of Science and Technology

nanoimprint lithography（NIL） is widely used in the fabrication of nano-scale semiconductor devices for its advantages of high resolution,low cost,and high throughput.However,traditional hard stamp imprinting has some drawbacks such as short stamp lifetime,bad uniformity in big areas,and large particle influence.In this paper, a flexible intermediate polymer stamp（IPS） is proposed to solve the drawbacks mentioned above.Meanwhile, we use a method of temperature-pressure variation imprinting to improve the resist liquidity in the process of imprinting,and eventually we achieve high quality patterns.This method combined with IPS has been used to fabricate a high quality grating whose half pitch is 50 nm.

关键词： nanoimprint lithography soft mold temperature-pressure variation

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High-refractive index acrylate polymers for applications in nanoimprint lithography

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Chinese Chemical Letters 2020年第1期31卷 256-260页

作者： Yunhui Tang Stefano Cabrini Jun Nie Carlos Pina-Hernandez State Key Laboratory of Chemical Resource Engineering Beijing University of Chemical TechnologyBeijing 100029China The Molecular Foundry LBNLBerkeleyCA 94702United States aBeam Technologies Castro ValleyCA 94546United States

The development of polymeric optical materials with a higher refractive index,transparency in the visible spectrum region and easier processability is increasingly desirable for advanced optical applications such as microlenses,image sensors,and organic light-emitting diodes.Most acrylates have a low refractive index(around 1.50)which does not meet the high perfo rmance requirements of advanced optical materials.In this research,three novel acrylates were synthesized via a facile one-step approach and used to fabricate optical transparent polymers.All of the polymers reveal good optical properties including high transparency(≥90%)in the visible spectrum region and high refractive index values(1.6363)at 550 nm.Moreover,nanostructures of these acrylate polymers with various feature sizes including nanogratings and photonic crystals were successfully fabricated using nanoimprint lithography.These results indicate that these acrylates can be used in a wide range of optical and optoelectronic devices where nanopatterned films with high refractive index and transparency are required.

关键词： High refractive index Acrylate Facile synthesis Nanostructure nanoimprint lithography

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Development and Implementation of a Rotating nanoimprint lithography Tool for Orthogonal Imprinting on Edges of Curved Surfaces

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Nanomanufacturing and Metrology 2021年第3期4卷 175-180页

作者： Shraddha Supreeti Ralf Schienbein Patrick FeBer Florian Fern Martin Hoffmann Stefan Sinzinger Electronics Technology Group Technical University of IlmenauIlmenauGermany Institute for Design and Precision Engineering Technical University of IlmenauIlmenauGermany Technical Optics Group Technical University of IlmenauIlmenauGermany JUMO GmbH&Co.KG FuldaGermany Microsystems Technology Group Ruhr-University BochumBochum.Germany

Uniform molding and demolding of structures on highly curved surfaces through conformal contact is a crucial yet often-overlooked aspect of nanoimprint lithography(NIL).This study describes the development of a NIL tool and its integration into a nanopositioning and nanomeasuring machine to achieve high-precision orthogonal molding and demolding for soft ultraviolet-assisted NIL(soft UV-NIL).The process was implemented primarily on the edges of highly curved plano-convex substrates to demonstrate structure uniformity on the edges.High-resolution nanostructures of sub-200-nm lateral dimension and microstructures in the range of tens of microns were imprinted.However,the nanostructures on the edges of the large,curved substrates were difficult to characterize precisely.Therefore,microstructures were used to measure the structure fidelity and were characterized using profilometry,white light interferometry,and confocal laser scanning microscopy.Regardless of the restricted imaging capabilities at high inclinations for high-resolution nanostructures,the scanning electron microscope(SEM)imaging of the structures on top of the lens substrate and at an inclination of 45°was performed.The micro and nanostructures were successfully imprinted on the edges of the plano-convex lens at angles of 45°,60°,and 90°from the center of rotation of the rotating NIL tool.The method enables precise imprinting at high inclinations,thereby presenting a different approach to soft UV-NIL on curved surfaces.

关键词： nanoimprint lithography Rotating NIL tool Curved surface Imprinting Nanopositioning

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High-aspect-ratio nanoimprint process chains

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Microsystems & Nanoengineering 2017年第1期3卷 221-232页

作者： Víctor J.Cadarso Nachiappan Chidambaram Loïc Jacot-Descombes Helmut Schift Laboratory for Micro-and Nanotechnology Research Division Synchrotron Radiation and NanotechnologyPaul Scherrer InstitutVilligen 5232Switzerland Micro Resist Technology GmbH Köpenicker Straße 325Berlin 12555Germany

Different methods capable of developing complex structures and building elements with high-aspect-ratio nanostructures combined with microstructures,which are of interest in nanophotonics,are presented.As originals for subsequent replication steps,two families of masters were developed:(i)3.2μm deep,180 nm wide trenches were fabricated by silicon cryo-etching and(ii)9.8μm high,350 nm wide ridges were fabricated using 2-photon polymerization direct laser writing.Both emerging technologies enable the vertical smooth sidewalls needed for a successful imprint into thin layers of polymers with aspect ratios exceeding 15.Nanoridges with high aspect ratios of up to 28 and no residual layer were produced in Ormocers using the micromoulding into capillaries(MIMIC)process with subsequent ultraviolet-curing.This work presents and balances the different fabrication routes and the subsequent generation of working tools from masters with inverted tones and the combination of hard and soft materials.This provides these techniques with a proof of concept for their compatibility with high volume manufacturing of complex micro-and nanostructures.

关键词： cryo-etching direct 6 write laser lithography high aspect ratio moulding nanoimprint lithography Ormocer photonic nanofences 2-photon polymerization

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Gap Plasmons Spilling-out for Single-Molecule SERS

Gap Plasmons Spilling-out for Single-Molecule SERS

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第十九届全国光散射学术会议

作者：刘凡新詹鹏吴蔚王振林浙江工业大学理学院应用物理系南京大学固体微结构物理国家重点实验室美国南加州大学工学院电子物理系

＜正＞Gap plasmonic nanostructures enable to create a high concentrated electromagnetic（EM）field within small volumes,and therefore can lead to single-molecule possible SERS detection.It is theoretically observed th... 详细信息

关键词： Gap plasmon nanofingers quantum effects plasmonics nanoimprint lithography

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电活性聚合物的微纳米结构与性能调控

电活性聚合物的微纳米结构与性能调控

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2014年全国高分子材料科学与工程研讨会

作者：丁光柱吴阳江胡志军苏州大学软凝聚态物理及交叉研究中心

聚合物由于具有长链的结构和在自组织过程中能够形成各向异性自组装体的特点,所以物理性质往往变现为各向异性。电活性聚合物由于在外电场的作用下其物理或化学性质能够发生变化而在近些年受到广泛关注。我们在近些年发展了利用纳米压... 详细信息

聚合物由于具有长链的结构和在自组织过程中能够形成各向异性自组装体的特点,所以物理性质往往变现为各向异性。电活性聚合物由于在外电场的作用下其物理或化学性质能够发生变化而在近些年受到广泛关注。我们在近些年发展了利用纳米压印过程中模板的纳米空间受限作用调控电活性聚合物的晶体和分子取向的方法,发现了结晶性聚合物在二维纳米空间受限条件下的取向规律,并且利用高度取向有序的电活性聚合物(例如聚噻吩

关键词： electroactive polymers nanoimprint lithography orientation structure-property relationship

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