检索结果-南通市图书馆

Modeling and experimental studies of a side band power re-injection locked magnetron

Chinese Physics B 2016年第12期25卷 492-498页

作者：叶文军张益袁萍朱铧丞黄卡玛杨阳 College of Electronics and Information Engineering Sichuan University

A side band power re-injection locked （SBPRIL） magnetron is presented in this paper. A tuning stub is placed between the external injection locked （EIL） magnetron and the circulator. Side band power of the EIL magnetron is reflected back to the magnetron. The reflected side band power is reused and pulled back to the central frequency. A phase-locking model is developed from circuit theory to explain the process of reuse of side band power in SBPRIL magnetron. Theoretical analysis proves that the side band power is pulled back to the central frequency of the SBPRIL magnetron, then the amplitude of the RF voltage increases and the phase noise performance is improved. Particle-in-cell （PIC） simulation of a 10-vane continuous wave （CW） magnetron model is presented. Computer simulation predicts that the frequency spectrum＇s peak of the SBPRIL magnetron has an increase of 3.25 dB compared with the free running magnetron. The phase noise performance at the side band offset reduces 12.05 dB for the SBPRIL magnetron. Besides, the SBPRIL magnetron experiment is presented. Experimental results show that the spectrum peak rises by 14.29% for SBPRIL magnetron compared with the free running magnetron. The phase noise reduces more than 25 dB at 45-kHz offset compared with the free running magnetron.

关键词： magnetrons injection locking tuning stub phase noise

来源：

维普期刊数据库

同方期刊数据库评论

在线全文

学校读者我要写书评

暂无评论

Crystallization Kinetics Study on Magnetron-Sputtered Amorphous TiA1 Alloy Thin Films

引用

Chinese Physics Letters 2014年第4期31卷 100-104页

作者： SHUI Lu-Yu YAN Biao School of Materials Science and Engineering Tongji University Shanghai 201804 Shanghai Key Lab of D&A for Metal-Functional Materials Shanghai 201804

Crystallization kinetics of magnetron-sputtered amorphous TiAl ahoy thin films is investigated by differential scanning calorimetry through isothermal analysis and non-isotherm analysis. In non-isothermai analysis, the Kissinger method and the Ozawa method are used to calculate the apparent activation energy and local activation energy, respectively, in the crystallization processes of amorphous TiA1 thin films. Furthermore, the crystallization mechanism is discussed from the investigation of the A vrami exponent by isothermal analysis. In addition, x-ray diffraction is utilized to reveal the grain orientation and evolution during the crystallization of TiA1 thin fihns.

关键词： CRYSTALLIZATION magnetrons AMORPHOUS alloys THIN films DIFFERENTIAL scanning calorimetry X-ray diffraction

来源：

维普期刊数据库评论

在线全文

维普期刊数据库

学校读者我要写书评

暂无评论

High-Power Simultaneous Wireless Information and Power Transfer: Injection-Locked Magnetron Technology

引用

ZTE Communications 2022年第2期20卷 3-12页

作者： YANG Bo MITANI Tomohiko SHINOHARA Naoki ZHANG Huaiqing RISH Kyoto UniversityKyoto 6110011Japan Chongqing University Chongqing 400044China

Applications using simultaneous wireless information and power transfer(SWIPT)have increased significantly.Wireless communication technologies can be combined with the Internet of Things to develop many innovative applications using SWIPT,which is mainly based on wireless energy harvesting from electromagnetic waves used in communications.Wireless power transfer that uses magnetrons has been developed for communication technologies.Injection-locked magnetrons that can be used to facilitate high-power SWIPT for several devices are reviewed in this paper.This new technology is expected to pave the way for promoting the application of SWIPT in a wide range of fields.

关键词： simultaneous wireless information and power transfer wireless power transfer magnetrons injection⁃locked Internet of Energy Internet of Things

来源：

维普期刊数据库评论

在线全文

维普期刊数据库

学校读者我要写书评

暂无评论

Magnetic Properties of Exchange-Coupled Dual-Layer SmTbCo Thin Films

引用

Chinese Physics Letters 2007年第1期24卷 226-228页

作者：黄致新高建明丁晓夏章平王翔李佐宜 Department of Physics Central China Normal University Wuhan 430079 Department of Physics Yunyang Teachers College Danjiangkou 442700 Department of Electronic Science and Technology Huazhong University of Science and Technology Wuhan 430074

Exchange-coupled SmTbCo dual-layer media are prepared by an r.f magnetron sputtering system and their magnetic properties are investigated. The prepared SmTbCo dual layer is composed of a 340 emu/cm^3 TM-rich readout layer and a 5.80 kOe RE-rich memory layer, meeting the requirements of high saturation magnetization and large coercivity for hybrid recording. Through exchange coupling, the coercivity of the high-saturation- magnetization SmTbCo layer is greatly enhanced from 1.85 to 5.96 kOe. The calculated interface wall energy for Sm6.65Tb12.35Co81 （20nm）/Sm1.22Tb42.16Co56.62 （20hm） is about 3.85erg/cm62. The reversal magnetization of the SmTbCo exchange-coupling dual-layer films is analysed based on a micro-magnetic model.

关键词： magnetrons SPUTTERING (Physics) MAGNETIZATION THIN films

来源：

维普期刊数据库评论

在线全文

维普期刊数据库

学校读者我要写书评

暂无评论

INTERFACE REACTION IN MAGNETIC MULTILAYERS

引用

Acta Metallurgica Sinica(English Letters) 2001年第6期14卷 479-484页

作者： G.H. Yu, M.H Li, F. W Zhu, X.F. Cui and J.L. Jin ( Department of Materials Physics, University of Science and Technology Beijing, Beijing 100083, China) ( State key laboratory for Advanced Metals and Materials, University of Science and Technology Beijing Department of MateriaLs Physics University of Science and Technology Beijing

Ta/NiO/NiFe/Ta multilayers were prepared by rf reactive and dc magnetron sputtering. The exchange coupling field (Hex) between NiO and NiFe reached 120O e. The composition and chemical states at the interface region of NiO/NiFe were studied using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe=Ni+FeO and 3NiO+2Fe=3Ni+Fe2O3. The thickness of the chemical reaction as estimated by angle-resolved XPS was about 1-1.5 nm. These interface reaction products are magnetic defects, and we believe that the Hex and the coercivity (Hc) of NiO/NiFe are affected by these defects. Moreover, the results also show that there is an intermixing layer at the Ta/NiO (and NiO/Ta) interface due to a thermodynamically favorable reaction: 2Ta+5NiO+Ta2O5. This interface reaction has an effect on the exchange coupling as well. The thickness of the intermixing layer as estimated by XPS depth-profiles was about 8-10 nm.

关键词： Fabrication Interfaces (materials) Magnetic materials magnetrons Reaction kinetics Sputtering

来源：

维普期刊数据库

同方期刊数据库评论

在线全文

学校读者我要写书评

暂无评论

欢迎您,

建议与咨询留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

时间限定

文献类型

馆藏选择

核心期刊

语言

文献类型

帮助

文字说明：

检索规则说明：

检索范例：

分类表

所选分类

限定检索结果

文献类型

馆藏范围

日期分布

学科分类号

主题

机构

作者

语言

在线全文

在线全文

在线全文

在线全文

在线全文

请选择保存的检索档案：

请选择收藏分类：

通借通还

欢迎您,

建议与咨询 留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

时间限定

文献类型

馆藏选择

核心期刊

语言

文献类型

帮助

文字说明：

检索规则说明：

检索范例：

分类表

所选分类

限定检索结果

文献类型

馆藏范围

日期分布

学科分类号

主题

机构

作者

语言

在线全文

在线全文

在线全文

在线全文

在线全文

请选择保存的检索档案： 新增检索档案 确定 取消

请选择收藏分类： 新增自定义分类 确定 取消

通借通还

建议与咨询留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

请选择保存的检索档案：

请选择收藏分类：