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Patterning two-dimensional semiconductors with thermal etching

InfoMat 2023年第11期5卷 64-77页

作者： Miaomiao Liu Ziwei Huang Yukun Guo Zhengwei Zhang Liqiang Zhang Hongmei Zhang Jiang Zhong Shanhao Li Wei Deng Di Wang Wei Li Ying Huangfu Xiangdong Yang Xidong Duan Hunan Provincial Key Laboratory of Two-Dimensional Materials and State Key Laboratory for Chemo/Biosensing and Chemometrics College of Chemistry and Chemical EngineeringHunan UniversityChangshathe People's Republic of China Hunan Key Laboratory of Nanophotonics and Devices School of Physics and ElectronicsCentral South UniversityChangshathe People's Republic of China Institute of Micro/Nano Materials and Devices Ningbo University of TechnologyNingbothe People's Republic of China

The controllable synthesis of complicated nanostructures in advanced two-dimensional(2D)semiconductors,such as periodic regular hole arrays,is essential and remains ***,we report a green,facile,highly controlled synthetic method to efficiently pattern 2D semiconductors,such as periodic regular hexagonal-shaped hole arrays(HHA),in *** the production of artificial defect arrays through laser irradiation with anisotropic annealing etching,we created HHA with different arrangements,controlled hole sizes,and densities in bilayer WS_(2).Atomic force microscopy(AFM),Raman,photoluminescence(PL),and scanning transmission electron microscopy(STEM)characterization show that the 2D semiconductors have high quality with atomical clean and sharp edges as well as undamaged crystals in the unetched ***,other nanostructures,such as nanoribbons and periodic regular triangular-shaped 2D-TMD arrays,can be *** kind of 2D semiconductors fabrication strategy is general and can be extended to a series of 2D *** functional theory(DFT)calculations show that one WS_(2)molecule from the edges of the laser-irradiated holed region exhibits a robust etching activation,making selective etching at the artificial defects and the fabrication of regular 2D semiconductors possible.

关键词： 2D transition-metal dichalcogenide materials atomically zigzag edges controlled size defect-induced thermal etching etching mechanism hexagonal-shaped hole array

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