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检索条件"主题词=charge collection"
21 条 记 录,以下是1-10 订阅
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charge collection of single event effects at Bragg's peak
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Science China(Physics,Mechanics & Astronomy) 2011年 第2期54卷 268-272页
作者: LIU Zheng CHEN ShuMing LIANG Bin LIU BiWei ZHAO ZhenYu College of Computer National University of Defense Technology Changsha 410073 China
Using Geant4 Monte Carlo code and Technology Computer-Aided Design(TCAD) simulation,energy deposition and charge collection of single event effects(SEE) are studied,which are induced by low-energy protons and α parti... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
The modulation effect of substrate doping on multi-node charge collection and single-event transient propagation in 90-nm bulk complementary metal-oxide semiconductor technology
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Chinese Physics B 2011年 第12期20卷 517-524页
作者: 秦军瑞 陈书明 刘必慰 刘征 梁斌 杜延康 School of Computer Science National University of Defense Technology
Variation of substrate background doping will affect the charge collection of active and passive MOSFETs in complementary metal-oxide semiconductor (CMOS) technologies, which are significant for charge sharing, thus... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
Defect-rich spinel ferrites with improved charge collection properties for efficient solar water splitting
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Journal of Advanced Ceramics 2023年 第3期12卷 612-624页
作者: Runfa Tan Yoo Jae Jeong Qu Li Minje Kang In Sun Cho Department of Materials Science&Engineering Ajou UniversitySuwon 16499Republic of Korea Department of Energy Systems Research Ajou UniversitySuwon 16499Republic of Korea
Spinel zinc ferrite(ZnFe_(2)O_(4),ZFO)is a potential photoanode material for photoelectrochemical(PEC)water splitting because of its ideal bandgap(1.9–2.1 eV)and superior chemical stability in aqueous ***,the low cha... 详细信息
来源: 维普期刊数据库 维普期刊数据库 评论
A new semiconductor-based SERS substrate with enhanced charge collection and improved carrier separation: CuO/TiO_(2) p-n heterojunction
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Chinese Chemical Letters 2023年 第7期34卷 434-438页
作者: Dongxue Yu Lin Xu Huizhu Zhang Jia Li Weie Wang Libin Yang Xin Jiang Bing Zhao College of Materials Science and Engineering College of PharmacyJiamusi UniversityJjiamusi 154007China State Key Laboratory of Supramolecular Structure and Materials jilin UniversityChangchun 130012China
In this paper, CuO/TiO_(2) p-n heterojunction was developed as a new surface enhanced Raman scattering(SERS) substrate to magnify Raman signal of 4-mercaptobenzoic acid(4-MBA) molecule. In the heterojunction-molecule ... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
Using 3D TCAD Simulation to Study charge collection of a p-n Junction in a 0.18μm Bulk Process
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Journal of Semiconductors 2008年 第9期29卷 1692-1697页
作者: 梁斌 陈书明 刘必慰 国防科技大学计算机学院 长沙410073
Single event transient of a real p-n junction in a 0.18μm bulk process is studied by 3D TCAD simulation. The impact of voltage, temperature, substrate concentration, and LET on SET is studied. Our simulation results ... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
Heavy ion energy influence on multiple-cell upsets in small sensitive volumes:from standard to high energies
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Nuclear Science and Techniques 2024年 第5期35卷 109-121页
作者: Yang Jiao Li-Hua Mo Jin-Hu Yang Yu-Zhu Liu Ya-Nan Yin Liang Wang Qi-Yu Chen Xiao-Yu Yan Shi-Wei Zhao Bo Li You-Mei Sun Pei-Xiong Zhao Jie Liu Institute of Modern Physics Chinese Academy of ScienceLanzhou 730000China University of Chinese Academy of Science Beijing 100049China Spallation Neutron Source Science Center Dongguan 523803China China Electronics Technology Group Corporation No.58 Research Institute Wuxi 214000China Beijing Microelectronics Technology Institute Beijing 100084China Institute of Microelectronics Chinese Academy of SciencesBeijing 100029China Key Laboratory of Science and Technology on Silicon Devices Chinese Academy of SciencesBeijing 100029China
The 28 nm process has a high cost-performance ratio and has gradually become the standard for the field of radiation-hardened ***,owing to the minimum physical gate length of only 35 nm,the physical area of a standard... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
Low-noise and low-power pixel sensor chip for gas pixel detectors
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Nuclear Science and Techniques 2024年 第3期35卷 142-152页
作者: Zhuo Zhou Shi-Qiang Zhou Dong Wang Xiang-Ming Sun Chao-Song Gao Peng-Zhen Zhu Wei-Ping Ren Jun Liu Mu-Xian Li Chen Lian Chun-Lai Dong PLAC Key Laboratory of Quark and Lepton Physics(MOE)Central China Normal UniversityWuhan 430079China
Topmetal-M2 is a large-area pixel sensor chip fabricated using the GSMC 130 nm CMOS process in *** pixel array of Topmetal-M2 consists of pixels of 400 rows×512 columns with a pixel pitch of 45μm×45μ*** array is d... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
A novel simulation method to evaluate the collection performance of a monolithic active pixel sensor
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Chinese Physics C 2011年 第10期35卷 940-945页
作者: 付民 唐祯安 School of Electronic Science and Technology Dalian University of Technology
A novel simulation method is presented in this paper to evaluate the collection performance of monolithic active pixel sensor (MAPS) devices for minimum ionizing particle tracking. A simplified 3D matrix pixel struc... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
Simulation analysis of heavy-ion-induced single-event response for nanoscale bulk-Si FinFETs and conventional planar devices
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Science China(Technological Sciences) 2017年 第3期60卷 459-466页
作者: YU JunTing CHEN ShuMing CHEN JianJun HUANG PengCheng College of Computer National University of Defense Technology Changsha 410073 China National Laboratory for Parallel and Distributed Processing National University of Defense Technology Changsha 410073 China
FinFET technologies are becoming the mainstream process as technology scales *** on 28-nm bulk-Si FinFETs and
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
Single event transients induced by pulse laser in Ge pMOSFETs and its supply voltage dependence
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Science China(Information Sciences) 2022年 第8期65卷 295-296页
作者: Jingyi LIU Xia AN Gensong LI Zhexuan REN Ming LI Xing ZHANG Ru HUANG Institute of Microelectronics Peking University
Dear editor,Germanium(Ge) has been considered as a promising candidate of channel material for sub-7 nm owing to its high carrier mobility and good compatibility with conventional Si CMOS process [1]. Although Ge-base... 详细信息
来源: 同方期刊数据库 同方期刊数据库 评论