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High-fidelity transfer of area-selective atomic layer deposition grown HfO_(2)through DNA origami-assisted nanolithography

引用

Nano Research 2022年第6期15卷 5687-5694页

作者： Xiaowan Yuan Daiqin Xiao Wei Yao Zhihao Zhang Lin Yang Liyuan Zhang Yibo Zeng Jiaqi Liao Shanxiong Luo Chonghao Li Hong Chen Xiangmeng Qu Key Laboratory of Sensing Technology and Biomedical Instruments of Guangdong Province and School of Biomedical Engineering Sun Yat-sen UniversityShenzhen 518107China Pen-Tung Sah Institute of Micro-Nano Science and Technology School of Electronic Science and Engineering(National Model Microelectronics College)Xiamen UniversityXiamen 361005China Harvard John A.Paulson School of Engineering and Applied Sciences Harvard UniversityCambridgeMA 02138USA Jiujiang Research Institute of Xiamen University Jiujiang 332000China

DNA origami-assisted nanolithography(DOANL)for fabricating custom-designed nanomaterials through pattern transfer from DNA origami to different substrates materials are ***,the pattern's integrity and resolution face considerable challenges due to the uncontrollable growth of the nanomaterials during transformation and the unclear mechanism of ***,we report a DOANL combined with area-selective atomic layer deposition(ALD)strategy for fabricating custom shapes hafnium oxide(HfO2)with the high-fidelity and *** find that the HfO_(2)selectively grows on DNA origami substrates in a hydroxyl-rich area instead of a methyl-rich protective *** with the merit of the area-selective ALD method,theHfO_(2)atom selectively coated on the DNA origami surface,thus,precisely modeling the shapes with high-precision in our study based on the surface groups difference of DNA origami and the naked hexamethyldisilane(HMDS)-treated substrates,which reveal the mechanical of high-fidelity pattern transfer based on *** a result,DNA origami structures can program the shape ofHfO_(2)*** DOANL that is based on the principle of"bottom-up"precision assembly breaks through the shape complexity and high-throughput fabrication limitation of theHfO_(2)nanostructures,including two-and three-dimensional structures,plane and curved structures,monolithic and hollow *** on the"top-down"accurate fabrication principle,the area-selective ALD on methyl-rich protective layer substrates improves the integrity and resolution of the pattern transfer ***,this work provides a general technology for nanofabrication strategy.

关键词： DNA origami masks DNA Origami-assisted nanolithography HfO_(2) area-selective atomic layer deposition

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