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Investigation of ultra-short-period W/C multilayers for soft x-ray optics

Chinese optics Letters 2005年第7期3卷 425-427页

作者：王风丽王占山秦树基吴文娟张众王洪昌陈玲燕 Institute of Precision Optical Engineering Tongji University Shanghai 200092Received December 22 2004

Ultra-short-period W/C multilayers having periodic thickness range of 1.15-3.01 nm have been fabricated for soft x-ray optics using the high vacuum direct current (DC) magnetron sputtering system. These multilayers were characterized by low-angle x-ray diffraction (LAxRD) and transmission electron microscope (TEM). The results show that the multilayer thin films with periodic thickness more than 1.5 nm have clear W-C interface and low roughness. But the structure of the periodic thickness below 1.5 nm is not clear. Finally, three ways to improve the performance of the multilayers are suggested.

关键词： Magnetron sputtering Optical films Thin films Transmission electron microscopy x ray diffraction analysis x ray optics

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Design and fabrication of broad angular range depth-graded C/W multilayer mirror for hard x-ray optics

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Chinese optics Letters 2005年第7期3卷 422-424页

作者：张众王占山王风丽吴文娟王洪昌秦树基陈玲燕 Institute of Precision Optical Engineering Department of Physics Tongji University Shanghai 200092Received December 21 2004

In this paper, a depth-graded C/W multilayer mirror with broad grazing incident angular range, consisting of three multilayer stacks, each of which has different period thickness d and the layer pair number, was designed and fabricated by direct current (DC) magnetron sputtering. For calculating the definite performance of such a mirror, the saturation effects of the interfacial imperfection, such as interface roughness and diffusion, were emerged. The reflectivity of the mirror was measured by the x-ray diffraction (xRD) instrument at Cu Kα radiation (λ = 0.154 nm), the measured reflectivity was about 30% in a broad grazing incident angular range (0.55°-0.85°). By the fitting data, the thickness of each layer is almost same as the one designed and the roughness in the multilayer is about 0.85 nm, which is larger than the prospective value of 0.5 nm.

关键词： Light reflection Magnetron sputtering Multilayers x ray diffraction analysis x ray optics

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Application of polycapillary x ray lens to eliminate both the effect of x ray source size and scatter of the sample in laboratory tomography

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Chinese optics Letters 2015年第9期13卷 92-96页

作者：孙学鹏刘志国孙天希易龙涛孙蔚渊李坊佐姜博文马永忠丁训良 The Key Laboratory of Beam Technology and Materials Modification of the Ministry of Education Beijing Normal University College of Nuclear Science and Technology Beijing Normal University Beijing Radiation Center Center for Disease Control and Prevention of Beijing

A tomography device based on a conventional laboratory x ray source, polycapillary parallel x ray lens （PPxRL）, and polycapillary collimating x ray lens （PCxRL） is designed. The PPxRL can collect the divergent x ray beam from the source and focus it into a quasi-parallel x ray beam with a divergence of 4.7 rarad. In the center of quasi-parallel x ray beam, there is a plateau region with an average gain in power density of 13.8 and a diameter of 630μm. The contrast of the image can be improved from 28.9% to 56.0% after adding the PCxRL between the sample and the detector.

关键词： Electron sources Optical instrument lenses Tomography x ray optics

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