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检索条件"主题词=UV exposure ratio"
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Scalable fabrication of microneedle arrays via spatially controlled uv exposure
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Microsystems & Nanoengineering 2016年 第1期2卷 73-81页
作者: Hidetoshi Takahashi Yun Jung Heo Nobuchika Arakawa Tesuo Kan Kiyoshi Matsumoto Ryuji Kawano Isao Shimoyama Department of Mechano-Informatics Graduate School of Information Science and Technologythe University of Tokyo7-3-1 HongoBunkyo-kuTokyo 113-8656Japan Department of Mechanical Systems Engineering Graduate School of EngineeringTokyo University of Agriculture and Technology2-24-16 Naka-choKoganei-shiTokyo 184-8588Japan Department of Mechanical Engineering and Intelligent Systems Graduate School of Informatics and Engineeringthe University of Electro-Communications1-5-1 ChofugaokaChofu-shiTokyo 182-8585Japan IRT Research Initiative the University of Tokyo7-3-1 HongoBunkyo-kuTokyo 113-8656Japan Department of Biotechnology and Life Science Graduate School of EngineeringTokyo University of Agriculture and Technology2-24-16 Naka-choKoganei-shiTokyo 184-8588Japan
This paper describes a theoretical estimation of the geometry of negative epoxy-resist microneedles prepared via inclined/rotated ultraviolet(uv)lithography based on spatially controlled uv exposure *** comparison wit... 详细信息
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