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Observation of the Structure of tungsten films Prepared by MOCVD

Plasma Science and Technology 2013年第9期15卷 955-960页

作者：张小锋刘维良于磊李玉杰郭双全 School of Materials Science & Engineering Jingdezhen Ceramic Institute Institute of Nuclear Materials University of Science and Technology Beijing School of Materials Science and Engineering Southwest Jiaotong University

The tungsten films with ultra microstructure on CuCrZr alloy and China Low Acti- vation Martensitic （CLAM） steel have been prepared by metal organic chemical vapor deposition （MOCVD）. The films were produced by pyrolysing the tungsten hexacarbonyl at air or argon atmosphere. When formed at or below 400 ℃, they were poorly crystalized and the films showed low quality in thickness, density, bonding performance etc. While above this temperature, the properties of tungsten films have been improved, all the films consist of tungsten in the β-W. And β-W can change into α-W after heat treatment. As in other variations of pyrolysis, oxy- gen and carbon were observed. When filled with argon, the oxygen and carbon content would reduce apparently. tungsten films prepared by MOCVD have stable chemical composition and microstructure. Besides, the properties of films on CuCrZr alloy are better than that on CLAM steel.

关键词： MOCVD tungsten hexacarbonyl tungsten film surface-modified

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Microstructure and Mechanical Properties of Nanocrystalline tungsten Thin films

引用

Journal of Materials Science & Technology 2010年第1期26卷 87-92页

作者： H.L. Sun, Z.X. Song, D.G. Guo, F. Ma and K.W. Xu State Key Laboratory for Mechanical Behavior of Materials, School of Materials Science and Engineering, Xi an Jiaotong University, Xi’an 710049, China State Key Laboratory for Mechanical Behavior of Materials School of Materials Science and Engineering Xi'an Jiaotong University Xi'an 710049 China

tungsten （W） thin films were prepared by magnetron sputtering onto Si （100） substrates. Their microstructures were characterized by X-ray diffraction （XRD）, field emission scanning electron microscopy （FE-SEM） and transmission electron microscopy （TEM）. The hardness and modulus were evaluated by nanoindentation. It is found that a 30 nm Cr sticking layer induces structure changes of deposited W film from β-W to α-W structure. In addition, remarkable hardness enhancement both for the deposited and annealed W films, were compared with that of bulk coarse-grained W, although their nanoindentation modulus is very close to that of corresponding bulk W. The intrinsic reasons that lead to structure changes and super hardness are discussed.

关键词： tungsten film Microstructure Nanoindentation Hardness Modulus

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