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Electron beam deposition and characterization of thin film Ti-Ni for shape memory applications

Rare Metals 2006年第Z2期25卷 237-242页

作者： NOH Hae-Yong JEE Kwang-Koo LEE Kyu-Hwan LEE Young-Kook Department of Metallurgical System Yonsei University Seoul 120-749 KoreaAdvanced Materials Research Center Division of Materials Korea Institute of Science and Technology Cheongryang Seoul 130-650 Korea Advanced Materials Research Center Division of Materials Korea Institute of Science and Technology Cheongryang Seoul 130-650 Korea Department of Metallurgical System Yonsei University Seoul 120-749 Korea

thin film of Ti-Ni alloy has a potential to perform the microactuation functions required in the microelectromechanical system (MEMS). It is essential, however, to have good uniformity in both chemical composition and thickness to realize its full potential as an active component of MEMS devices. Electron beam evaporation technique was employed in this study to fabricate the thin films of Ti-Ni alloy on different substrates. The targets used for the evaporation were first prepared by electron beam melting. The uniformity of composition and microstructure of the thin films were characterized by electron probe microanalysis (EPMA), Auger electron spectroscopy (AES), X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and transmission electron microscopy (TEM). The mechanical property of the thin films was evaluated by the nano-indentation test. The martensitic transformation temperature was measured by differential scanning calorimetry (DSC). It is confirmed that the chemical composition of deposited thin films is identical to that of the target materials. Furthermore, results from depth profiling of the chemical composition variation reveal that the electron beam evaporation process yields better compositional homogeneity than other conventional methods such as sputtering and thermal evaporation. Microstructural observation by TEM shows that nanometer size precipitates are preferentially distributed along the grain boundaries of a few micron size grains. The hardness and elastic modulus of thin films decreases with an increase in Ti contents.

关键词： electron beam evaporation tini sma thin film martensitic transformation reverse martensitic transformation

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