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Integrated modelling of vacuum flashover development: Above-surface processes and breakdown threshold analyses

HIGH VOLTAGE 2024年第3期9卷 614-625页

作者： Sun, Guangyu Yao, Yitong Yang, Xiong Guo, Baohong Zhang, Shu Wang, Chao Lian, Ruhui Song, Baipeng Mu, Haibao Zhang, Guanjun Xi An Jiao Tong Univ Sch Elect Engn State Key Lab Elect Insulat & Power Equipment Xian Shaanxi Peoples R China

The flashover in vacuum is a rapid interfacial discharge across the insulator surface when subjected to high applied voltage. Here a theoretical model covering above-surface processes is introduced. The model calculates the flashover threshold in vacuum, with revised secondary electron emission avalanche theory and improved desorbed neutral transport model. The model serves as the first part of an integrated flashover model, aiming for consistent treatment of both above-surface and subsurface processes during the entire flashover development. The flashover threshold is obtained by combining the desorbed neutral pressure at given applied voltage and the gas breakdown criterion dictated by the Paschen's law. An analytical formula for threshold estimation containing physical parameters, and a simplified formula consisting of empirical coefficients are introduced, catering for both conceptual understanding and practical application. The derived formulae are validated by experimental data for a variety of insulator materials. The theory generalisation for non-uniform electric field distribution is further discussed.

关键词： secondary electrons INSULATORS EMISSION VOLTAGE FIELD DC

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Plasma Wall Potentials with secondary Electron Emissions up to the Stable Space-Charge-Limited Condition

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Plasma Science and Technology 2013年第11期15卷 1093-1099页

作者： Jongho SEON Ensang LEE School of Space Research Kyung Hee University Seocheon-dong Giheung-gu Yongin-si

Numerical solutions to floating plasma potentials for walls emitting secondary elec- trons are obtained for various surface materials. The calculations are made with plasma moment equations and the secondary electron emission coefficients, which were determined from recent laboratory experiments. The results estimate the wall potentials up to the physical conditions that allow stable plasma sheaths under the space-charge-limited condition. The materials often used in the laboratory, such as aluminum, silicon, boron, molybdenum, silicon dioxide, and alumina, are considered. The minimum wall potential before the onset of space-charge-limited emission is determined by the electron temperatures at which the effective secondary electron emission coefficient integrated over the velocity distributions is about 0.62. The corresponding potential is given by -eφ0 ,- 1.87kBT. The condition for space-charge-limited emission is newly found by numerically searching for all the stable sheaths. The new condition is -eφ0 - 0.95kBT, and this predicts a wall potential that is less negative than the previously found one. Calculation of the power dissipated to the wall for hydrogen plasmas shows that there is a large difference in terms of power dissipation among the considered materials in the temperature range 20-50 eV.

关键词： secondary electrons plasma sheath wall potential space-charge-limited emission

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A MONTE CARLO SIMULATION OF secondary ELECTRON AND BACKSCATTERED ELECTRON IMAGES IN SCANNING ELECTRON MICROSCOPY

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Acta Metallurgica Sinica(English Letters) 2005年第3期18卷 351-355页

作者： H.M.Li Z.J.Ding HefeiNationalLaboratoryforPhysicalSciencesatMicroscaleandDepartmentofPhysics UniversityofScienceandTechnologyofChinaHefei230026China

A new parallel Monte Carlo simulation method of secondary electron (SE) and back scattered electron images (BSE) of scanning electron microscopy (SEM) for a com plex geometric structure has been developed. This paper describes briefly the si mulation method and the modification to the conventional sampling method for the step length. Example simulation results have been obtained for several artifici al structures.

关键词： Monte Carlo SEM secondary electrons backscattered electrons,

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