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Laser Interference Lithography for Fabrication of planar scale gratings for Optical Metrology

Nanomanufacturing and Metrology 2021年第1期4卷 3-27页

作者： Yuki Shimizu Department of Finemechanics Tohoku University6-6-01Aramaki Aza-AobaAoba-kuSendaiMiyagi 980-8579Japan

Laser interference lithography is an attractive method for the fabrication of a large-area two-dimensional planar scale grating,which can be employed as a scale for multi-axis optical encoders or a diffractive optical element in many types of optical ***,optical configurations such as Lloyd's mirror interferometer based on the division of wavefront method can generate interference fringe fields for the patterning of grating pattern structures at a single exposure in a stable *** the fabrication of a two-dimensional scale grating to be used in a planar/surface encoder,an orthogonal two-axis Lloyd's mirror interferometer,which has been realized through innovation to Lloyd’s mirror interferometer,has been *** addition,the concept of the patterning of the two-dimensional orthogonal pattern structure at a single exposure has been extended to the non-orthogonal two-axis Lloyd’s mirror ***,the optical setup for the non-orthogonal two-axis Lloyd's mirror interferometer has been optimized for the fabrication of a large-area scale *** this review article,principles of generating interference fringe fields for the fabrication of a scale grating based on the interference lithography are reviewed,while focusing on the fabrication of a two-dimensional scale grating for planar/surface *** of the pitch of the fabricated pattern structures,whose accuracy strongly affects the performance of planar/surface encoders,is also an important task to be *** this paper,major methods for the evaluation of a grating pitch are also reviewed.

关键词： planar scale grating Interference lithography Lloyd’s mirror interferometer Interference fringe

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