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Chinese Optics Letters 2006年第11期4卷 678-681页

作者：周莹耿永友顾冬红 Shanghai Institute of Optics and Fine Mechanics Chinese Academy of SciencesShanghai 201800 Graduate School of the Chinese Academy of Sciences Beijing 100039 Shanghai Institute of Optics and Fine Mechanics Chinese Academy of SciencesShanghai 201800

The influence of oxygen partial pressure on the optical properties of NiOx thin films deposited by reactive DC-magnetron sputtering from a nickel metal target in a mixture gas of oxygen and argon was presented. With the oxygen ratio increasing, the reflectivity of the as-deposited films decreased, and optical band gap increased. Thermogravimetric analysis （TGA） showed that the decompose temperature of the films was above 250℃. After annealed at 400℃, only films deposited at 5% O2/Ar ratio showed high optical contrast which was about 52%. Scanning electron microscope （SEM） results revealed that the changes of surface morphology were responsible for the optical property variations of the films after annealing. Its thermal stability and high optical contrast before and after annealing made it a good potential write-once optical recording medium. OCIS codes： 310.6860, 310.3840, 210.4810, 300.6470.

关键词： Annealing Magnetron sputtering Morphology Optical properties Optical recording partial pressure Reflection Scanning electron microscopy Thermodynamic stability Thermogravimetric analysis Thin films

Effects of oxygen partial pressure on optical absorption edge and UV emission energy of ZnO films

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Chinese Optics Letters 2005年第7期3卷 428-431页

作者：洪瑞金邵建达贺洪波范正修 Research and Development Center for Optical Thin Film Coatings Shanghai Institute of Optics and Fine MechanicsChinese Academy of Sciences Shanghai 201800Graduate School of Chinese Academy of Sciences Beijing 100864Received September 15 2004 Research and Development Center for Optical Thin Film Coatings Shanghai Institute of Optics and Fine MechanicsChinese Academy of Sciences Shanghai 201800

The optical absorption edge and ultraviolet (UV) emission energy of ZnO films deposited by direct current (DC) reactive magnetron sputtering at room temperature have been investigated. With the oxygen ratio increasing, the structure of films changes from zinc and zinc oxide coexisting phase to single-phase ZnO and finally to the highly (002) orientation. Both the grain size and the stress of ZnO film vary with the oxygen partial pressure. Upon increasing the oxygen partial pressure in the growing ambient, the visible emission in the room-temperature photoluminescence spectra was suppressed without sacrificing the band- edge emission intensity in the ultraviolet region. The peaks of photoluminescence spectra were located at 3.06—3.15 eV. Prom optical transmittance spectra of ZnO films, the optical band gap edge was observed to shift towards shorter wavelength with the increase of oxygen partial pressure.

关键词： Film preparation Grain size and shape Light absorption Magnetron sputtering Oxygen partial pressure Photoluminescence Ultraviolet spectroscopy Zinc oxide

＂partial pressures＂ of humid air in wide pressure and temperature ranges

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Frontiers in Energy 2013年第4期7卷 511-517页

作者： Zidong WANG Hanping CHEN Shilie WENG School of Mechanical Engineering Shanghai Jiao Tong University Shanghai 200040 China

＂partial pressure＂ in humid air is a question very much concerned by scientists and no satisfactory answer has been found to date. This paper proposes a novel method to obtain the ＂partial pressures＂ of the water vapor and dry air in humid air. The results obtained by the proposed method are quite different from that obtained by Dalton＇s partial pressure law. The fundamental behaviors of water vapor and dry air are studied in depth in wide pressure and temperature ranges. Semi-permeable membrane models are proposed and applied for both saturated and unsaturated humid air. ＂Improvement factors＂ are developed to quantitatively describe the magnitude of the interaction between dissimilar molecules. One discovery is that the ＂partial pressure＂ of the water vapor in saturated humid air equals Ps, rather than （***） which was formerly believed. The other is that the interaction between dissimilar molecules may be omitted when temperature is above ＂cutting-off temperature＂ for unsaturated humid air. This paper satisfactorily answers the quest of ＂partial pressures＂ in humid air from a new perspective.

关键词： partial pressure Dalton's partial pressure law humid air saturated unsaturated

Thermokinetic and conductivity analyzes of the high CO2 chemisorption on Li5AlO4 and alkaline carbonate impregnated Li5AlO4 samples:Effects produced by the use of CO2 partial pressures and oxygen addition

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Journal of Energy Chemistry 2017年第5期26卷 919-926页

作者： Pedro Sánchez-Camacho J.Francisco Gómez-García Heriberto Pfeiffer Laboratorio de Fisicoquímica y Reactividad de Superficies(LaFReS) Instituto de Investigaciones en MaterialesUniversidad Nacional Autońoma de MexicoCircuito exterior s/nCd.UniversitariaDel.Coyoacan C.P.04510Ciudad de Me´xicoMexico

The effect of COpartial pressure was evaluated during the COchemisorption in penta lithium aluminate（LiAlO）, using different COand Opartial pressures in the presence or absence of alkaline carbonates. Results showed that using low PO（0.1） did not affect the kinetic and final COchemisorption process. Moreover, small additions of oxygen（PO= 0.05） into the mixture flue gas, seemed to increase the COchemisorption. Additionally, the presence of alkaline carbonates modified the COcapture temperature range. COchemisorption kinetic parameters were determined assuming a double exponential model where direct COchemisorption and COchemisorption controlled by diffusion processes are ***, ionic diffusion was analyzed by ionic conduction analysis, where all the gravimetric and ionic measurements were in good agreement showing different diffusion processes depending on ***, the oxygen and alkaline carbonate additions have positive effects during the COchemisorption process in LiAlO, and a possible reaction mechanism is presented.

关键词： CO2 capture Thermogravimetric analysis partial pressure Ionic conduction

Study on absorbance and laser damage threshold of HfO_2 films prepared by ion-assisted reaction deposition

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Chinese Optics Letters 2004年第5期2卷 305-307页

作者：张大伟范树海高卫东贺洪波王英剑邵建达范正修孙浩杰 R&D Center for Optical Thin Film Coatings Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences Shanghai 201800 Qufu First High School Qufu 273100

Using a new kind of EH1000 ion source, hafnium dioxide (HfO2) films are deposited with different deposition techniques and different conditions. The absorbance and the laser damage threshold of these films have been measured and studied. By comparing these characteristics, one can conclude that under right conditions, such as high partial pressure of oxygen and right kind of ion source, the ion-assisted reaction deposition can prepare HfO2 films with higher laser induced damage threshold.

关键词： Deposition Oxides partial pressure Thin films

Calibration of Quadrupole Mass Spectrometers for Gas Quantity and Gas Flow Measurements

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Calibration of Quadrupole Mass Spectrometers for Gas Quantit...