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The Study of Different Structuring Techniques for Creation of non-evaporable Getters

Materials Sciences and Applications 2013年第8期4卷 57-61页

作者： Anton Boyko Dahir Gaev Sergei Timoshenkov Yuri Chaplygin Vladimir Petrov Kabardino-Balkarian State University Moscow Russia National Research University of Electronic Technology Moscow Russia Research Institute of Advanced Materials and Technology Moscow Russia

The results of observation of different structuring techniques of thin metal layers applied in micro system technologies are presented. The Ti V getter films formed by magnetron sputtering have been explored using scanning electron and atomic-force microscopy, Brunauer-Emmett-Teller method, thermogravimetric analysis and fractal geometry. The film sorption capacity for hydrogen given by thermogravimetry was of 7.7 m3·Pa·g-1. To estimate the effective surface area, the fractal geometry tools were used and the calculated value of the specific surface area was about 155 m2/m3. The second object under investigation was a structure composed of micro- and mesoporous silicon and copper layer deposited electrochemically on the pore walls. Porous silicon when coupled with a reactive metal or alloy is expected to be an effective getter for micro system techniques. The use of porous silicon and specific conditions of depositions allows to form the structure of complex fractal type with a specific surface area of 167 m2/cm3.

关键词： non-evaporable Getters MEMS Structuring Magnetron Sputtering Electrodeposition Porous Silicon

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Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method

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Nuclear Science and Techniques 2017年第4期28卷 44-50页

作者： Jie Wang Bo Zhang Yan-Hui Xu Yong Wang National Synchrotron Radiation Laboratory University of Science and Technology of China Hefei 230029 China

An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced longitudinal pressure *** accumulation of pollutants such as N_2 and O_2 will decrease the adsorption ability of the NEG,leading to a reduction of NEG ***,an NEG thin film coated with a layer of Pd,which has high diffusion rate and absorption ability for H_2,can extend the service life of NEG and improve the pumping rate of H_2 as *** this paper,with argon as discharge gas,a magnetron sputtering method is adopted to prepare TiZrV-Pd films in a long straight *** SEM measurement,deposition rates of TiZrV-Pd films are analyzed under different deposition parameters,such as magnetic field strength,gas flow rate,discharge current,discharge voltage and working *** comparing the experimental results with the simulation results based on Sigmund's theory,the Pd deposition rate C can be estimated by the sputtered depth.

关键词： TiZrV-Pd Deposition rates Magnetron sputtering method non-evaporable getter

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