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MATHEMATICAL MODELS OF nitrogen concentration profile OF ION NITRIDED LAYERS AND COMPUTER SIMULATION

Acta Metallurgica Sinica(English Letters) 1989年第7期2卷 18-26页

作者： XIA Lifang YAN Mufu Harbin Institute of Technology,Harbin,China Laboratory of Metal Materials and Heat treatment,Harbin Institute of Technology,Harbin,China

The mathematical models of the kinetics of the layer growth at different ion nitriding condi- tions of armco *** 45,40Cr,42CrMo and 38CrMoAl have been *** on these models the expression of nitrogen concentration profile of ion nitrided layers have been deduced with profile simulating *** are C_=C_(min)^+(P_4)/(ξ_1-x)+(P_5)/(ξ_(10)~2)(ξ_1-x)~2 C_(γ′)=C_(min)^(γ′)+(P_1)/(ξ_(21))(ξ_2-x)+(P_2)/(ξ_(21)~2)(ξ_2-x)~2 C_α=C_(min)~α+(C_(33))/(C_(33))/(ξ_(32))(ξ_3-x)~3 Using these models,the kinetics of layer growth and the nitrogen concentration profile of ion nitrided layers were sinulated on Apple-Ⅱ *** show that the simulated curves coincide quite well with the experimental data.

关键词： computer simulation ion nitriding nitrogen concentration profile

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Mathematical Models and Computer Simulation of nitrogen concentration profiles in Pulse Ion Nitrided Layers

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Journal of Shanghai Jiaotong university(Science) 2000年第1期5卷 294-297页

作者： Mufu Yan, Jihong Yan, Lifang Xia, Yong Sun, Tom Bell 1.School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, P. R. China 2.Department of Automation, Tsinghua University, Beijing 100084, P. R. China 3.School of Meta

The nitrogen concentration profiles in surface layers and surface phase structures were accurately measured respectively using the glow discharge spectrometry and X-ray Diffractometer after the specimens had been pulse ion nitrided at 500℃ for 0.2-8h The results show that the compound layer growth, which is different from that of conventional DC nitriding, conforms to parabolic law At the same time the surface nitrogen concentration change little with increasing the nitriding time, at least it is so when the treating time is longer than 0.2h In addition, the mathematical models of nitrogen concentration profiles in ε -Fe2~3N,γ-Fe4N and α -Fe phases have been established. Using them the nitrogen concentration profiles in nitrided layers were simulated. Results show that the simulated curves coincide quite well with the experimental data.

关键词： Pulse Ion Nitriding nitrogen concentration profile Computer Simulation

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