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Patterning single-layer materials by electrical breakdown using atomic force microscopy

Nanotechnology and Precision Engineering 2024年第1期7卷 71-77页

作者： Yajie Yang Jiajia Lu Yanbo Xie Libing Duan School of Physical Science and Technology Northwestern Polytechnical UniversityXi’an 710072China School of Aeronautics and Institute of Extreme Mechanics Northwestern Polytechnical UniversityXi’an 710072China

The development of nanoelectronics and nanotechnologies has been boosted signiﬁcantly by the emergence of 2D materials because of their atomic thickness and peculiar properties,and developing a universal,precise patterning technology for single-layer 2D materials is critical for assembling nanodevices.Demonstrated here is a nanomachining technique using electrical breakdown by an AFM tip to fabricate nanopores,nanostrips,and other nanostructures on demand.This can be achieved by voltage scanning or applying a constant voltage while moving the tip.By measuring the electrical current,the formation process on single-layer materials was shown quantitatively.The present results provide evidence of successful pattern fabrication on single-layer MoS2,boron nitride,and graphene,although further conﬁrmation is still needed.The proposed method holds promise as a general nanomachining technology for the future.

关键词： 2D material nanopattern AFM Electrical breakdown Lithography

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nanopattern Transformation ofABC Triblock Copolymer Thin Films Induced by Strong Solvent Selectivity and Annealing

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Chemical Research in Chinese Universities 2017年第4期33卷 684-688页

作者： HUANG Hailiang ZU Xihong YI Guobin ZHONG Benbin LUO Hongsheng School of Chemical Engineering and Light Industry Guangdong University of Technology Guangzhou 510006 P. R. China

Nanopattem transformation behaviors of polyisoprene-block-polystyrene-block-poly（2-vinylpyridine）（PI-b-PS-b-P2VP） asymmetric ABC triblock copolymer were investigated systematically with various control para- meters, including different solvents for polymer solution and annealing conditions in this paper. Ordered nanopattern of PI-b-PS-b-P2VP with hexagonal cylinders could be obtained when PI-b-PS-b-P2VP toluene solution was spin-coated on silicon substrate followed by toluene vapor annealing process. When the film with hexagonal and cylindrical nanopattern was exposed to saturated toluene vapor, the order-order transition of cylindrical nanopattern to parallel nanopattern was observed due to the strong selectivity of toluene to PS and PI blocks. Furthermore, fingerprint nanopattern could also be obtained by solvent annealing in tetrahydrofuran vapor. The nanopattern trans- formation was due to different selectivity of solvents and incompatibilities of the three blocks of PI-b-PS-b-P2VP under various solvent annealing conditions.

关键词： Triblock copolymer nanopattern Self-assembly Solvent vapor annealing

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Patterning of Triblock Copolymer Film and Its Application for Surface-enhanced Raman Scattering

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Chinese Journal of Polymer Science 2017年第5期35卷 623-630页

作者： Hai-liang Huang 易国斌 Xi-hong Zu Ben-bin Zhong Hong-sheng Luo School of Chemical Engineering and Light Industry Guangdong University of Technology

In this paper, microphase behavior of an ABC triblock copolymer, polystyrene-block-poly（2-vinylpyridine）-block- poly（ethylene oxide）, namely PS-b-P2VP-b-PEO, was systematically studied during spin-coating and solvent vapor annealing based on various parameters, including the types of the solvent, spin speed and thickness. The morphological features and the microdomain location of the different blocks were characterized by atomic force microscope （AFM） and high resolution transmission electron microscopy （HRTEM）. With increasing thickness, the order-order transition from nanopores array to the pattern of nanostripes was observed due to microdomain coarsening. These processes of pattern transformation were based on the selectivity of toluene for different blocks and on the contact time between solvent molecules and the three blocks. This work provides different templates for preparation of gold nanoparticle array on silicon wafer, which can be adopted as an active surface-enhanced Raman scattering （SERS） substrate for poly（3-hexylthiophene）（P3HT）.

关键词： Self-assembly Triblock copolymer nanopattern Nanoparticle array Raman spectroscopy

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