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第18届国际真空大会

作者： L.J. Wang * J. Huang R. Xu K. Tang J.J. Zhang Y. B. Xia School of Materials Science & Engineering Shanghai University Shanghai 200072 China

Recently, there has been increasing scientific interest in the synthesis and characterization of nanocrystalline diamond （NCD） films since these films possess smoother surfaces and lower friction coefficients than microcrystalline diamond （MCD） films. This makes them a better coating material for mechanical applications without tedious, time-consuming, and costly postpolishing. Furthermore, the smoother surfaces and wide band gap make NCD films candidates for advanced optical or electronic components. Especially, diamond film radiation hardness and chemical resistance strongly motivate its use for fabricating detectors operating in hostile environments such as those encountered in the nuclear industry and high energy physics. However, a high surface roughness, up to several hundred nanometers or several microns, makes polycrystalline MCD films unfit for conventional process technique of microelectronics.

关键词： nano-crystalline diamond film radiation detector chemical vapor deposition

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Preparation of nano-crystalline diamond films on Poly-crystalline diamond Thick films by Microwave Plasma Enhanced Chemical Vapor Deposition

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Plasma Science and Technology 2010年第3期12卷 310-313页

作者：熊礼威汪建华满卫东翁俊刘长林 Institute of Plasma Physics Chinese Academy of Sciences Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province Wuhan Institute of Technology

nano-crystalline diamond （NCD） films were prepared on poly-crystalline diamond （PCD） thick flims by the microwave plasma enhanced chemical vapor deposition （MPCVD） method. Free standing PCD thick film （50 mm in diameter） with a thickness of 413 μm was deposited in CHn/H2 plasma. It was then abraded for 2 hours and finally cut into pieces in a size of 10×10 mm^2 by pulse laser. NCD fihns were deposited on the thick film substrates by introducing a micro-crystalline diamond （MCD） interlayer. Results showed that a higher carbon concentration （5%） and a lower substrate temperature （650℃） were feasible to obtain a highly smooth interlayer, and the appropriate addition of oxygen （2%） into the gas mixture was conducive to obtaining a smooth nano-crystalline diamond film with a tiny grain size.

关键词： diamond thick film nano-crystalline diamond film microwave plasma en hanced chemical vapor deposition

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Effects of hydrogen plasma etching treatment on the structural and optical properties of nano-crystalline diamond films

Effects of hydrogen plasma etching treatment on the structur...

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第18届国际真空大会

作者： L.J. Wang * J. Huang R. Xu K. Tang J.J. Zhang Y. B. Xia School of Materials Science & Engineering Shanghai University Shanghai 200072 China

X-ray lithography （XRL） is one of the next generation lithography （NGL） which is the lithography technology slated to replace photolithography beyond the 32 nm node. One of the key factors in X-ray lithography using synchrotron radiation is the manufacture of reliable masks on suitable substrate materials. diamond has potential as an X-ray mask carrier due to its unique characteristics. However, the surfaces roughness is the greatest obstacle of traditional diamond film for the applications in optical use. Thus, efficient approaches have to be exploited to grow transparent diamond film through reducing micrometer scale diamond grains down to the nanometer scale. In this thesis, nano-crystalline diamond （NCD） films are investigated for X-ray mask to obtain sufficient optical transmittance and surface roughness.

关键词： nano-crystalline diamond film optical properties chemical vapor deposition

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