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Atomosphere boundary layer height determination and observation from ceilometer measurements over Hefei during the total solar on July 22,2009 eclipse

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Chinese Optics Letters 2010年第5期8卷 439-442页

作者：何俊峰刘文清张玉钧阚瑞峰陈臻懿阮俊 Anhui Institute of Optics and Fine Mechanics Chinese Academy of Sciences Artillery Academy

Using an improved inflexion point method（IIPM）,we investigate atmosphere boundary layer（ABL） height evolution over Hefei during the total solar eclipse on July 22,2009.A lidar ceilometer is used in ground-based *** of ABL heights before,during,and after the solar eclipse are analyzed using the *** indicate that the IIPM,which is less sensitive to background noise,is more suitable in detecting ABL height and temporal *** demonstrate that the total solar eclipse resultes in a decrease in ABL height,indicating a suppression of turbulence activity,similar to that observed during the sunset *** in ABL height are associated with a slow change in temperature,indicating a significant weakening of penetrative convection and a time lag between ABL response and the reduction in solar radiation.

关键词： meteorological instruments Optical radar Sun Troposphere

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Qualification of superpolished substrates for laser-gyro by surface integrated scatter measurement

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Chinese Optics Letters 2010年第2期8卷 181-183页

作者：魏志猛龙兴武杨开勇 College of Optoelectric Science and Engineering National University of Defense Technology

Integrated scatterometer for qualification of superpolished substrates for laser-gyro by surface scatter loss measurement is constructed. Different from the qualification of substrate by surface roughness, the scatterometer measures the forward surface scatter loss to check whether the mirror made of the substrate will be suitable for the required laser-gyro lock-in specification. The scatterometer utilizes convex lens instead of integrating sphere to collect scatter light. Special sample support and baffle are designed to block unwanted light. The result of stability test is given, which is about 0.4% over 10 h.

关键词： Gyroscopes meteorological instruments Mirrors Surface measurement Surface roughness

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Novel technique for characterizing feature profiles in photolithography process

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Chinese Optics Letters 2012年第6期10卷 37-40页

作者：王帆陆海亮张青云 Anatoly Burov Shanghai Micro Electronics Equipment Co. Ltd

A novel angle-resolved scatterometer based on pupil optimization for feature profile measurement in a photolithography process is *** impact of image sensor errors is minimized by optimizing the intensity distribution of the incident light using a spatial light *** scatterometry sensitivity of feature measurement at different polarization conditions is calculated using the rigorous coupled-wave and first-order analyses,and the reproducibility of the scatterometer is *** results show that the sensitivity and reproducibility of the angle-resolved scatterometer increase by 90% and 40% with pupil optimization,respectively.

关键词： meteorological instruments Photolithography

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