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magnetron sputtering deposition of silicon nitride on polyimide separator for high-temperature lithium-ion batteries

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Journal of Energy Chemistry 2021年第5期30卷 1-10页

作者： Can Liao Wei Wang Junling Wang Longfei Han Shuilai Qiu Lei Song Zhou Gui Yongchun Kan Yuan Hu State Key Laboratory of Fire Science University of Science and Technology of ChinaHefei 230026AnhuiChina

To date,lithium-ion batteries are becoming increasingly significant in the application of portable devices and electrical vehicles,and revolutionary progress in theoretical research and industrial application has been ***,the commercial polyolefin separators with unsatisfying electrolytes affinity and poor thermal stability have extremely restricted the further application of lithium-ion batteries,especially in the high-temperature *** this work,magnetron sputtering deposition technique is employed to modify the commercial polyimide separator by coating silicon nitride on both *** sputtering deposition modified polyimide(MSD-PI)composite separator shows high thermal stability and ionic *** importantly,compared with the cells using Celgard separator,the cells with MSD-PI separator exhibit superior electrochemical performance,especially long-term cycle performance under high temperature environment,owing to the high thermal conductivity of surface Si3 N4 ***,lithium-ion batteries with MSD-PI separator are capable of improving thermal safety and capacity retention,which demonstrates that magnetron sputtering deposition technique could be regarded as a promising strategy to develop advanced organic/inorganic composite separators for high-temperature lithium-ion batteries.

关键词： Polyimide magnetron sputtering deposition Lithium-ion batteries High temperature Safety

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Preparation and Corrosion Resistance of Magnesium Coatings by magnetron sputtering deposition

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Journal of Materials Science & Technology 2003年第5期19卷 459-462页

作者： Hongwei HUO, Ying LI and Fuhui WANGState Key Laboratory for Corrosion and Protection, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China State Key Laboratory for Corrosion and Protection Institute of Metal Research Chinese Academy of Sciences Shenyang 110016 China

Magnesium coatings were fabricated on stainless steel substrates (1Cr11Ni2W2MoV) by a plane magnetron sputtering technique. The argon pressure and the substrate condition (including temperature and the substrate was rotated or fixed) were varied in order to evaluate the influence of the parameters on the crystal orientation and morphology of the coating. The corrosion behavior of the coatings in 1 wt pct NaCI solution was studied by electrochemical methods. The results showed that all coatings exhibited preferred orientation (002) as the argon pressure increased from 0.2 to 0.4 Pa. The morphologies of the coatings varied with the argon pressure and with whether the substrate was rotated or fixed. The open circuit potential of the coatings was more positive than that of cast AZ91D magnesium alloy. However, the immersion test in 1 wt pct NaCI solution showed that the corrosion rates of the coatings were higher than that of cast AZ91D magnesium alloy.

关键词： Magnesium coating Corrosion magnetron sputtering deposition

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Effect of bias voltage on microstructure of DC magnetron sputtered Al coatings on uranium

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中国有色金属学会会刊：英文版 2004年第z1期14卷 247-250页

作者： Lü Xue-chao Chinese Acad Engn Phys Mianyang 621900 Peoples R China

The effect of different bias voltages on microstructure of Al coatings on uranium was investigated by using scanning electron microscope (SEM), X-ray diffraction (XRD) and X-ray stress analyzer, respectively. The results indicate that the microstructure is influenced strongly by bias voltage. At low bias voltages, especially at -100 V, the structure of Al coatings is more densely packed than that at high bias voltages of -300 V and -400 V, where the structure looks like open dentritic. On the whole, the peak (111) orientation is predominant with the increase of bias voltage, but at -400 V, the diffractive intensity of main peaks (111) and (200) is close to the standard reference. The residual stress on Al coatings surface is small, which has a change from tensile to compressive stress with the increase of bias voltage.

关键词： magnetron sputtering deposition bias voltage coatings microstructure uranium

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Composition and Microstructure of magnetron sputtering Deposited Ti-containing Amorphous Carbon Films

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Journal of Materials Science & Technology 2007年第4期23卷 571-573页

作者： Jun DU Ping ZHANG National Key Laboratory for Remanufacturing Academy of Armored Force Engineering Beijing 100072 China

Ti-containing carbon films were deposited by using magnetron sputtering deposition. The composition and microstructure of the carbon films were characterized in detail by combining the techniques of Rutherford backscattering spectrometry （RBS）, X-ray photoelectron spectroscopy （XPS）, X-ray diffraction （XRD） and transmission electron microscopy （TEM）. It is found that carbon films contain Ti 18 at pct; after Ti incorporation, the films consist of titanium carbide; C1s peak appears at 283.4 eV and it could be divided into 283.29 and 284.55 eV, representing sp2 and sp3, respectively, and sp2 is superior to sp3. This Ti-containing film with dominating sp2 bonds is nanocomposites with nanocrystalline TiC clusters embedded in an amorphous carbon matrix, which could be proved by XRD and TEM.

关键词： magnetron sputtering deposition Carbon film, Carbon bond structure

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