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magnetron sputtering deposition of [FePt/Ag]_n multilayers for perpendicular recording

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Rare Metals 2006年第1期25卷 47-50页

作者： WANG Fang XU Xiaohong WU Haishun School of Chemistry and Materials Science Shanxi Normal University Linfen 041004 China

[FePt/Ag]n multilayers were deposited on glass substrates by RF magnetron sputtering and ex situ annealed at 550℃ for 30 min. The effects of inserted Ag layer thickness and the number of bilayer repetitions （n） on the structure and magnetic properties of the multilayers were investigated. It was found that the difference between in-plane and out-of-plane coercivities varied with an increase of inserted Ag layer thickness in the [FePt 2 nm/Ag x nm]10 multilayers. The ratio of out-of-plane coercivity to in-plane coercivity reached the maximum value with the Ag layer thickness of 5 nm, indicating that the Ag layer thickness plays an important role in obtaining perpendicular orientation. For the [FePt 2 nm/Ag 5 um]n multilayers, perpendicular orientation is also influenced by n. The maximum value of the ratio of out-of-plane coercivity to in-plane coercivity appeared when n was given as 8. It was found that the [FePt 2 nm/Ag 5 nm]8 had a high perpendicular coercivity of 520 kA/m and a low in-plane one of 88 kA/m, which shows a strong perpendicular anisotropy.

关键词： [FePt/Ag]n multilayer perpendicular orientation magnetron sputtering coercivity

Growth and properties of hydrogenated microcrystalline silicon thin films prepared by magnetron sputtering with different substrate temperatures

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Rare Metals 2022年第3期41卷 1037-1042页

作者： Lin-Qing Wang Wei-Yan Wang Jin-Hua Huang Rui-Qin Tan Wei-Jie Song Jian-Min Chen State Key Laboratory of Solid Lubrication Lanzhou Institute of Chemical PhysicsChinese Academy of SciencesLanzhou 730000China University of Chinese Academy of Sciences Beijing 100049China Ningbo Institute of Material Technology and Engineering Chinese Academy of SciencesNingbo 315201China Faculty of Information Science and Engineering Ningbo UniversityNingbo 315211China

Hydrogenated microcrystalline silicon (μcSi:H) thin films were deposited by an radio frequency (RF)(13.56 MHz) magnetron sputtering at different substrate temperatures (100–300℃), and the influences of substrate temperature on the growth and properties ofμc-Si:H thin films were investigated. Surface roughness and crystallinity of the thin films increase as substrate temperature increases. And all thin films are at the transition region(X_(c)=49.2%~61.0%). Theμc-Si:H thin films deposited at lower substrate temperature (≤200℃) represent a weak(220) preferred orientation, while the thin films deposited at higher substrate temperature (≥250℃) exhibit a weak(111) preferred orientation. The μc-Si:H thin films have a dense structure, and the structural compactness of the thin films slightly increases with substrate temperature increasing. The Fourier transform infrared spectroscopy (FTIR) results indicate that theμc-Si:H thin films have a low hydrogen content (3.9 at%–5.6 at%), which is in favor of reducing light-induced degradation effect.

关键词： μc-Si:H thin films magnetron sputtering Substrate temperature Hydrogen content

Magnetic properties and microstructures of terbium coated and grain boundary diffusion treated sintered Nd-Fe-B magnets by magnetron sputtering

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Journal of Rare Earths 2021年第2期39卷 167-173页

作者： Wei Zhu Yang Luo Zilong Wang Xinyuan Bai Haijun Peng Dunbo Yu National Engineering Research Center for Rare Earth Materials GRINM Group Co.Ltd.Beijing 100088China GRIREM Advanced Materials Co. Ltd.Beijing 100088China General Research Institute for Nonferrous Metals Beijing 100088China

Tb coating on the surface of commercial sintered Nd-Fe-B magnet was prepared by DC magnetron *** secondary heat treatment was used to regulate the microstructure for the enhancement of coercivity,namely diffusion treatment and annealing *** coercivity increases significantly from 18.3 to 28.0 kOe,the remanence decreases slightly from 14.1 to 14.0 kGs,and the comprehensive magnetic properties are higher than 75(Hcj+(BH)_(max)=76.7).SEM results indicate that,on the one hand,950℃is the optimal diffusion *** diffusion temperature results in insufficient diffusion of Tb *** diffusion temperature can lead to the main phase grain growth,the decrease of Nd-rich phase,and forming holes in the *** the other hand,500℃is the optimal annealing *** annealing temperature can result in the reduction of Nd-rich *** annealing temperature can generate the non-defined Nd-rich thin layer between grains.

关键词： Sintered Nd-Fe-B magnets magnetron sputtering Tb coating Magnetic properties Rare earths

Lithium intercalation/de-intercalation behavior of a composite Sn/C thin film fabricated by magnetron sputtering

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Rare Metals 2008年第5期27卷 507-512页

作者： ZHAO Lingzhi HU Shejun LI Weishan LI Liming HOU Xianhua Department of Chemistry South China Normal UniversiO Guangzhou 510006 China Faculty of Material and Energy Guangdong University of Technology Guangzhou 510006 China Key Lab of Technology on Electrochemical Energy Storage and Power Generation in Guangdong Universities Guangzhou 510006 China Department of Mathernatics and Physics Wuyi University Jiangmen 529020 China

A tin film of 320 nm in thickness on Cu foil and its composite film with graphite of-50 nm in thickness on it were fabricated by magnetron sputtering. The surface morphology, composition, surface distributions of alloy elements, and lithium intercalation/de-intercalation behaviors of the fabricated films were characterized by X-ray diffraction （XRD）, scanning electron microscopy （SEM）, electron probe microanalyzer （EPMA）, X-ray photoelectron spectroscopy （XPS）, inductively coupled plasma atomic emission spectrometry （ICP）, cyclic voltammetry （CV）, and galvanostatic charge/discharge （GC） measurements. It is found that the lithium intercalation/de-intercalation behavior of the Sn film can be significantly improved by its composite with graphite. With cycling, the discharge capacity of the Sn film without composite changes from 570 mAh/g of the 2nd cycle to 270 mAh/g of the 20th cycle, and its efficiency for the discharge and charge is between 90% and 95%. Nevertheless, the discharge capacity of the composite Sn/C film changes from 575 mAh/g of the 2nd cycle to 515 mAh/g of the 20th cycle, and its efficiency for the discharge and charge is between 95% and 100%. The performance improvement of tin by its composite with graphite is ascribed to the retardation of the bulk tin cracking from volume change during lithium intercalation and de-intercalation, which leads to the pulverization of tin.

关键词： lithium-ion battery anode magnetron sputtering composite film lithium intercalation/de-intercalation

Structural and optical analysis of Cr_2N thin films prepared by DC magnetron sputtering

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International Journal of Minerals,Metallurgy and Materials 2015年第2期22卷 197-202页

作者： Shakil Khan A.Mahmood A.Shah Qaiser Raza Muhammad Asim Rasheed Ishaq Ahmad Department of Metallurgy and Materials Engineering Pakistan Institute of Engineering and Applied Sciences National Institute of Laser and Optronics (NILOP) National Centre for Physics Quaid-i-Azam University

Chromium nitride （Cr2N） thin films were prepared by a DC magnetron sputtering technique. The deposition temperature was raised from 50 to 300℃, and its influence on the film structure and refractive index was investigated. X-ray diffraction analysis shows that the crystalline strucure of the films transforms from the （101） to （002） oriented hexagonal CrzN phase as the increase of substrate tempera- ture above 50℃, and a highly texatred film grows at 100℃. An empirical relation between the crystalline orientation and infrared active modes of the films is obtained, i.e., the Fourier transform infrared （FTIR） spectrum of the film prepared at 50℃ exhibits only A1 （TO） mode. The prominent peak in the FTIR spectra of the film prepared above 50℃is assigned to the E1 （TO） mode and is correlated with the （002） or c-axis oriented hexagonal wurtzite phase of Cr2N. In the surface analysis of atomic force microscopy, a transformation from the featureless surface to columnar-type morphology is observed with the increase of substrate temperature from 50 to 100℃, exhibiting c-axis oriented crystallite growth. A further increase in substrate temperature to 200℃ causes the c-axis crystallites to merge, resulting in the formation of voids. The refractive index （n） of the deposited films is obtained using spectroscopic ellipsometry.

关键词： chromium nitride thin films magnetron sputtering structural analysis optical analysis refractive index

Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced magnetron sputtering

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Plasma Science and Technology 2010年第5期12卷 571-576页

作者：牟宗信王春牟晓东贾莉刘升光董闯 Key Laboratory of Materials Modification by Laser Ion and Electron Beams Ministry of Education School of Physics and Optoelectronic technology Dalian University of Technology

An experimental study of the effect of applied magnetic field on the properties of the plasma and electrostatic oscillations in an unbalanced magnetron sputtering discharge was carried out. The apparatus consists of a magnetron sputtering target, using the conventional magnetic field configuration, and a coaxial coil around the target for an applied axial magnetic field. The dependencies of plasma parameters on the coil current were studied by two Langmuir probes. The resonance properties of electrostatic oscillations were observed. The results indicate that the applied magnetic field affects the plasma properties for the coil current in a range of 0 A to 8 A. The frequency bandwidth of the electrostatic oscillations in the unbalanced magnetron sputtering plasma is in a range of 0 kHz to 300 kHz. From the spectrum analysis, the eigenfrequency near the target is in a range of 20 kHz to 50 kHz under typical experimental conditions where all the magnetic field, pressure, and power etc are able to have full impact on the spectrum characteristics. The calculated value of the electron temperature as per an ion acoustic standing wave pattern inside the magnetic trap is in good agreement with the experimental result.

关键词： plasma magnetron sputtering oscillation resonance

Effects of O_2/Ar ratio and annealing temperature on electrical properties of Ta_2O_5 film prepared by magnetron sputtering

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Chinese Physics B 2013年第2期22卷 481-486页

作者：黄仕华程佩红陈勇跃 Department of Physics Zhejiang Normal University

The effects of the oxygen-argon ratio on electric properties of Ta2O5 film prepared by radio-frequency magnetron sputtering were *** Ta2O5 partially transforms from the amorphous phase into the crystal phase when annealing temperatures are 800℃ or *** lattice constant of Ta2O5 decreases with the increase of the O2/Ar ratio,which indicates that oxygen gas in the working gas mixture contributes to reducing the density of oxygen vacancies during the deposition *** the films deposited in working gas mixtures with different O2/Ar ratios and subsequently annealed at 700℃,the effective dielectric constant is increased from 14.7 to 18.4 with the increase of the O2/Ar ratio from 0 to *** the presence of an SiO2 layer between the film and the silicon substrate,the optimal dielectric constant of Ta2O5 film was estimated to be *** gas in the working gas mixture contributes to reducing the density of oxygen vacancies,and the oxygen vacancy density and leakage current of Ta2O5 film both decrease with the increase of the O2/Ar *** leakage current decreases after annealing treatment and it is minimized at 700℃.However,when the annealing temperature is 800℃ or higher,it increases slightly,which results from the partially crystallized Ta2O5 layer containing defects such as grain boundaries and vacancies.

关键词： Ta2O5 film magnetron sputtering C-V oxide charge

Al-doped ZnO/WO_(3) heterostructure films prepared by magnetron sputtering for isopropanol sensors

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Rare Metals 2024年第1期43卷 247-256页

作者： Wei-Xiang Gao Xue-Ting Chang Xiao-Jie Zhu Jun-Feng Li Ying-Chang Jiang Dong-Sheng Wang Chuan-Xiao Yang Shi-Bin Sun College of Logistics Engineering Shanghai Maritime UniversityShanghai 201306China College of Ocean Science and Engineering Shanghai Maritime UniversityShanghai 201306China Institute of Logistics Science and Engineering Shanghai Maritime UniversityShanghai 201306China

Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to develop the MOSs-based gas sensors for sensing isopropanol with desired performance via a simple, effective,and controllable method. Herein, we reported the preparation of the Al-doped Zn O(AZO)/WO_(3) heterostructure films by directly depositing the AZO coating onto the WO_(3) coating using a strategy of magnetron sputtering. The AZO/WO_(3) heterostructure films were constructed by numbers of irregular nanoparticles that were interconnected with each other. The AZO/WO_(3) heterostructure films-based gas sensors exhibited excellent isopropanolsensing performance with high response, promising selectivity, low detection limit, fast response rate, wide detection range, and ideal reproducibility. The promising isopropanol-sensing performance of the AZO/WO_(3) heterostructure films arises mainly from their high uniformity, unique microstructures with high surface roughness,and the construction of the heterostructure between the AZO and WO_(3) coatings. This work provides a versatile approach to prepare the MOSs-based heterostructure films for assembling the gas sensors.

关键词： Metal oxide semiconductors Gas sensors Aldoped ZnO/WO_(3) Heterostructure films Isopropanol magnetron sputtering

Effects of N_2/O_2 flow rate on the surface properties and biocompatibility of nano-structured TiO_xN_y thin films prepared by high vacuum magnetron sputtering

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Chinese Physics B 2015年第7期24卷 321-326页

作者： Sehrish Saleem R.Ahmad Uzma Ikhlaq R.Ayub Jin Wei Hong Xu Rui Zhen Li Peng Hui Khizra Abbas Paul K.Chu Department of Physics Government College University Department of Physics and Materials Science City University of Hong Kong Centre for Advanced Studies in Physics (CASP) Government College University

NiTi shape memory alloys（SMA） have many biomedical applications due to their excellent mechanical and biocompatible properties. However, nickel in the alloy may cause allergic and toxic reactions, which limit some applications. In this work, titanium oxynitride films were deposited on NiTi samples by high vacuum magnetron sputtering for various nitrogen and oxygen gas flow rates. The x-ray diffraction（XRD） and x-ray photoelectron spectroscopy（XPS） results reveal the presence of different phases in the titanium oxynitride thin films. Energy dispersive spectroscopy（EDS） elemental mapping of samples after immersion in simulated body fluids（SBF） shows that Ni is depleted from the surface and cell cultures corroborate the enhanced biocompatibility in vitro.

关键词： titanium oxynitride films magnetron sputtering biocompatibility