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Selective adsorption behavior of ion-imprinted magnetic chitosan beads for removal of Cu(Ⅱ) ions from aqueous solution

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Chinese Journal of Chemical Engineering 2021年第11期34卷 103-111页

作者： Licheng Ma Qi Zheng State Key Laboratory of Multiphase Complex Systems Institute of Process EngineeringChinese Academy of SciencesBeijing 100190China Rare Metals and Metallurgy Materials Research Institute General Research Institute for Nonferrous MetalsBeijing 100008China

Heavy metal ion is one of the major environmental pollutants.In this study,a Cu(Ⅱ)ions imprinted magnetic chitosan beads are prepared to use chitosan as functional monomer,Cu(Ⅱ)ions as template,Fe_(3)O_(4) as magnetic core and epichlorohydrin and glutaraldehyde as crosslinker,which can be used for removal Cu(Ⅱ)ions from wastewater.The kinetic study shows that the adsorption process follows the pseudosecond-order kinetic equations.The adsorption isotherm study shows that the Langmuir isotherm equation best fits for the monolayer adsorption processes.The selective adsorption properties are performed in Cu(Ⅱ)/Zn(Ⅱ),Cu(Ⅱ)/Ni(Ⅱ),and Cu(Ⅱ)/Co(Ⅱ)binary systems.The results shows that the ⅡMCD has a high selectivity for Cu(Ⅱ)ions in binary systems.The mechanism of ⅡMCD recognition Cu(Ⅱ)ions is also discussed.The results show that the ⅡMCD adsorption Cu(Ⅱ)ions is an enthalpy controlled process.The absolute value of DH(Cu(Ⅱ))and DS(Cu(Ⅱ))is greater than DH(Zn(Ⅱ),Ni(Ⅱ),Co(Ⅱ))and DS(Zn(Ⅱ),Ni(Ⅱ),Co(Ⅱ)),respectively,this indicates that the Cu(Ⅱ)ions have a good spatial matching with imprinted holes on ⅡMCD.The FTIR and XPS also demonstrates the strongly combination of function groups on imprinted holes in the suitable space position.Finally,the ⅡMCD can be regenerated and reused for 10 times without a significantly decreasing in adsorption capacity.This information can be used for further application in the selective removal of Cu(Ⅱ)ions from industrial wastewater.

关键词： ion imprinted techniques Selective recognition ion-imprinted magnetic chitosan beads Kinetic Thermodynamics

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