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Laser interference Lithography for Fabrication of Planar Scale Gratings for Optical Metrology

Nanomanufacturing and Metrology 2021年第1期4卷 3-27页

作者： Yuki Shimizu Department of Finemechanics Tohoku University6-6-01Aramaki Aza-AobaAoba-kuSendaiMiyagi 980-8579Japan

Laser interference lithography is an attractive method for the fabrication of a large-area two-dimensional planar scale grating,which can be employed as a scale for multi-axis optical encoders or a diffractive optical element in many types of optical sensors.Especially,optical configurations such as Lloyd's mirror interferometer based on the division of wavefront method can generate interference fringe fields for the patterning of grating pattern structures at a single exposure in a stable manner.For the fabrication of a two-dimensional scale grating to be used in a planar/surface encoder,an orthogonal two-axis Lloyd's mirror interferometer,which has been realized through innovation to Lloyd’s mirror interferometer,has been developed.In addition,the concept of the patterning of the two-dimensional orthogonal pattern structure at a single exposure has been extended to the non-orthogonal two-axis Lloyd’s mirror interferometer.Furthermore,the optical setup for the non-orthogonal two-axis Lloyd's mirror interferometer has been optimized for the fabrication of a large-area scale grating.In this review article,principles of generating interference fringe fields for the fabrication of a scale grating based on the interference lithography are reviewed,while focusing on the fabrication of a two-dimensional scale grating for planar/surface encoders.Verification of the pitch of the fabricated pattern structures,whose accuracy strongly affects the performance of planar/surface encoders,is also an important task to be addressed.In this paper,major methods for the evaluation of a grating pitch are also reviewed.

关键词： Planar scale grating interference lithography Lloyd’s mirror interferometer interference fringe

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Analysis of Optical Properties of Off-Axis Reflective Volume Holographic Grating

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Optics and Photonics Journal 2016年第8期6卷 136-144页

作者： Zhenmin Shen Weidong Shang Yuzhao Wang Long Gao Yuliang Tao Jukui Yang Laboratory of Laser Engineering and Technology Beijing Institute of Space Mechanics & Electricity Beijing China

The coupled wave theory for volume holographic grating with curved interference fringes has been proposed based on the Kogelnik’s coupled wave theory with the plane interference fringes. The formula about the magnitude and directional angle of grating vector in arbitrary position of volume holographic grating with curved grating has been deduced. We found that the wavelength selectivity and angular selectivity may be different in different position of volume holographic curved stripe grating which depend on the angle between the propagation vector of reference beam and signal beam. The larger the angle, the greater the angle and wavelength selectivity, whereas the weaker.

关键词： Volume Holographic Grating Couple Wave Theory interference fringe

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